JPS5742523A - Preparation of amorphous silicon film - Google Patents
Preparation of amorphous silicon filmInfo
- Publication number
- JPS5742523A JPS5742523A JP55117479A JP11747980A JPS5742523A JP S5742523 A JPS5742523 A JP S5742523A JP 55117479 A JP55117479 A JP 55117479A JP 11747980 A JP11747980 A JP 11747980A JP S5742523 A JPS5742523 A JP S5742523A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- silicon film
- gas
- monosilane gas
- direct electrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55117479A JPS5742523A (en) | 1980-08-26 | 1980-08-26 | Preparation of amorphous silicon film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55117479A JPS5742523A (en) | 1980-08-26 | 1980-08-26 | Preparation of amorphous silicon film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5742523A true JPS5742523A (en) | 1982-03-10 |
JPS6332863B2 JPS6332863B2 (es) | 1988-07-01 |
Family
ID=14712711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55117479A Granted JPS5742523A (en) | 1980-08-26 | 1980-08-26 | Preparation of amorphous silicon film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5742523A (es) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59127647A (ja) * | 1983-01-11 | 1984-07-23 | Mitsui Toatsu Chem Inc | 非晶質薄膜の製法 |
JPS59179151A (ja) * | 1983-03-30 | 1984-10-11 | Mitsui Toatsu Chem Inc | 非晶質薄膜の製法 |
-
1980
- 1980-08-26 JP JP55117479A patent/JPS5742523A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59127647A (ja) * | 1983-01-11 | 1984-07-23 | Mitsui Toatsu Chem Inc | 非晶質薄膜の製法 |
JPS59179151A (ja) * | 1983-03-30 | 1984-10-11 | Mitsui Toatsu Chem Inc | 非晶質薄膜の製法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6332863B2 (es) | 1988-07-01 |
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