JPS5740846A - Ion injector - Google Patents

Ion injector

Info

Publication number
JPS5740846A
JPS5740846A JP11761180A JP11761180A JPS5740846A JP S5740846 A JPS5740846 A JP S5740846A JP 11761180 A JP11761180 A JP 11761180A JP 11761180 A JP11761180 A JP 11761180A JP S5740846 A JPS5740846 A JP S5740846A
Authority
JP
Japan
Prior art keywords
time difference
ion
energy
modulation
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11761180A
Other languages
Japanese (ja)
Inventor
Kiyoshi Kanekawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11761180A priority Critical patent/JPS5740846A/en
Publication of JPS5740846A publication Critical patent/JPS5740846A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Abstract

PURPOSE:To measure incidence energy easily and accurately by detecting the time difference between the output signal of a modulation means and that of a density detection means and the ion speed and energy depending upon the detected time difference. CONSTITUTION:A deflected ion beam passes through an ion density detection section 22 and is injected into a semiconductor substrate 17. The density detection section 22 detects the change of ion density immediately before the semiconductor substrate 17 and this detection signal is sent to a time difference measurement circuit 23. Besides, the modulation signal is sent from a modulation section 18 to the time difference measurement circuit 23 and the time difference between this detection signal and modulation signal is measured. As a result, by pre-establishing a relationship among time difference, acceleration speed, and ion energy, the ion energy can easily be calculated.
JP11761180A 1980-08-26 1980-08-26 Ion injector Pending JPS5740846A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11761180A JPS5740846A (en) 1980-08-26 1980-08-26 Ion injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11761180A JPS5740846A (en) 1980-08-26 1980-08-26 Ion injector

Publications (1)

Publication Number Publication Date
JPS5740846A true JPS5740846A (en) 1982-03-06

Family

ID=14716039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11761180A Pending JPS5740846A (en) 1980-08-26 1980-08-26 Ion injector

Country Status (1)

Country Link
JP (1) JPS5740846A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4761559A (en) * 1986-09-24 1988-08-02 Eaton Corporation Ion beam implantation display method and apparatus
US6137112A (en) * 1998-09-10 2000-10-24 Eaton Corporation Time of flight energy measurement apparatus for an ion beam implanter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4761559A (en) * 1986-09-24 1988-08-02 Eaton Corporation Ion beam implantation display method and apparatus
US6137112A (en) * 1998-09-10 2000-10-24 Eaton Corporation Time of flight energy measurement apparatus for an ion beam implanter

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