JPS5735768B2 - - Google Patents

Info

Publication number
JPS5735768B2
JPS5735768B2 JP5651677A JP5651677A JPS5735768B2 JP S5735768 B2 JPS5735768 B2 JP S5735768B2 JP 5651677 A JP5651677 A JP 5651677A JP 5651677 A JP5651677 A JP 5651677A JP S5735768 B2 JPS5735768 B2 JP S5735768B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5651677A
Other languages
Japanese (ja)
Other versions
JPS52140355A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS52140355A publication Critical patent/JPS52140355A/ja
Publication of JPS5735768B2 publication Critical patent/JPS5735768B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP5651677A 1976-05-18 1977-05-18 Method of measuring thickness of thin film Granted JPS52140355A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68746276A 1976-05-18 1976-05-18

Publications (2)

Publication Number Publication Date
JPS52140355A JPS52140355A (en) 1977-11-22
JPS5735768B2 true JPS5735768B2 (de) 1982-07-30

Family

ID=24760542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5651677A Granted JPS52140355A (en) 1976-05-18 1977-05-18 Method of measuring thickness of thin film

Country Status (6)

Country Link
JP (1) JPS52140355A (de)
CA (1) CA1086870A (de)
DE (1) DE2721589A1 (de)
FR (1) FR2393266A1 (de)
GB (1) GB1561313A (de)
NL (1) NL185306C (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI59489C (fi) * 1978-11-21 1981-08-10 Enso Gutzeit Oy Foerfarande foer maetning av belaeggningsmaengder
JPS5758300U (de) * 1980-09-22 1982-04-06
DE3129049A1 (de) * 1981-07-23 1983-02-24 Hoesch Werke Ag, 4600 Dortmund Verfahren und vorrichtung zur zerstoerungsfreien bestimmung der dicke der eisen-zinn-zwischenschicht an elektrolytisch verzinntem blech
JPS60140105A (ja) * 1983-12-27 1985-07-25 Shimadzu Corp 多層膜分析装置
JPS60142205A (ja) * 1983-12-29 1985-07-27 Shimadzu Corp 多層膜分析装置
DD278866A1 (de) * 1987-11-20 1990-05-16 Akad Wissenschaften Ddr Verfahren zur phosphorgehaltsbestimmung in stromlos abgeschiedenen metallueberzuegen
JP3706989B2 (ja) * 1999-04-07 2005-10-19 富士通株式会社 蛍光x線を用いた膜厚測定方法
JP4966160B2 (ja) * 2007-10-26 2012-07-04 シャープ株式会社 膜厚測定方法
JP5494322B2 (ja) * 2009-12-28 2014-05-14 株式会社デンソー Cntワイヤの製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4874864A (de) * 1971-12-29 1973-10-09
JPS4919222A (de) * 1972-06-15 1974-02-20

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4874864A (de) * 1971-12-29 1973-10-09
JPS4919222A (de) * 1972-06-15 1974-02-20

Also Published As

Publication number Publication date
NL7705443A (nl) 1977-11-22
NL185306B (nl) 1989-10-02
NL185306C (nl) 1990-03-01
JPS52140355A (en) 1977-11-22
FR2393266A1 (fr) 1978-12-29
DE2721589A1 (de) 1977-12-01
CA1086870A (en) 1980-09-30
GB1561313A (en) 1980-02-20
FR2393266B1 (de) 1982-03-19

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