JPS5729045B2 - - Google Patents
Info
- Publication number
- JPS5729045B2 JPS5729045B2 JP14864074A JP14864074A JPS5729045B2 JP S5729045 B2 JPS5729045 B2 JP S5729045B2 JP 14864074 A JP14864074 A JP 14864074A JP 14864074 A JP14864074 A JP 14864074A JP S5729045 B2 JPS5729045 B2 JP S5729045B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14864074A JPS5729045B2 (ja) | 1974-12-27 | 1974-12-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14864074A JPS5729045B2 (ja) | 1974-12-27 | 1974-12-27 |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56182284A Division JPS5943820B2 (ja) | 1981-11-16 | 1981-11-16 | 位置整合装置 |
| JP56182283A Division JPS608724B2 (ja) | 1981-11-16 | 1981-11-16 | 検出装置 |
| JP56182282A Division JPS6025896B2 (ja) | 1981-11-16 | 1981-11-16 | 位置検出方式 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5176979A JPS5176979A (ja) | 1976-07-03 |
| JPS5729045B2 true JPS5729045B2 (ja) | 1982-06-21 |
Family
ID=15457302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14864074A Expired JPS5729045B2 (ja) | 1974-12-27 | 1974-12-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5729045B2 (ja) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53135653A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting optical device |
| JPS5453967A (en) * | 1977-10-07 | 1979-04-27 | Canon Inc | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
| DE2822269C2 (de) * | 1978-05-22 | 1983-12-01 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur automatischen Ausrichtung von zwei aufeinander einzujustierenden Objekten |
| JPS5618936U (ja) * | 1979-07-23 | 1981-02-19 | ||
| EP0097147B1 (en) * | 1981-12-21 | 1986-09-03 | BURROUGHS CORPORATION (a Delaware corporation) | Improvement in and relating to the manufacture of wafer scale integrated circuits |
| JPS58208603A (ja) * | 1982-05-31 | 1983-12-05 | Hitachi Ltd | 位置検出方法 |
-
1974
- 1974-12-27 JP JP14864074A patent/JPS5729045B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5176979A (ja) | 1976-07-03 |