JPS5727056A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5727056A JPS5727056A JP10279080A JP10279080A JPS5727056A JP S5727056 A JPS5727056 A JP S5727056A JP 10279080 A JP10279080 A JP 10279080A JP 10279080 A JP10279080 A JP 10279080A JP S5727056 A JPS5727056 A JP S5727056A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- region
- metals
- shaped
- buffer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 229910052751 metal Inorganic materials 0.000 abstract 6
- 239000002184 metal Substances 0.000 abstract 6
- 150000002739 metals Chemical class 0.000 abstract 4
- 229910052750 molybdenum Inorganic materials 0.000 abstract 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 1
- 230000002411 adverse Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000011733 molybdenum Substances 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/452—Ohmic electrodes on AIII-BV compounds
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To form an excellent electrode to a P type region without exerting an adverse effect to a PN junction by shaping an Au electrode on molybdenum through a buffer metal. CONSTITUTION:P type impurities are introduced into an N type GaAs semiconductor substrate 1, a P<+> type region 3 with the P<+>-N junction 2 is shaped, and an opening for forming an electrode in an ohmic contact manner is molded to an oxide film 5 on the region 3. Mo is evaporated to the opening section under vacuum on the surface of the region 3, and the foundation ohmic electrode 6 is formed. The Au electrode 9 is shaped on the electrode 6 through the buffer metals. That is, Ti7- Pt8-Au9 group metals are coated, and used as electrodes on the P<+> region. Metals having thermal expansion coefficients between the thermal expansion coefficients of Mo and Au are used as the buffer metals. An ohmic electrode 10 is shaped at the N side with an AuGe-Ni group metal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10279080A JPS5727056A (en) | 1980-07-25 | 1980-07-25 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10279080A JPS5727056A (en) | 1980-07-25 | 1980-07-25 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5727056A true JPS5727056A (en) | 1982-02-13 |
Family
ID=14336907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10279080A Pending JPS5727056A (en) | 1980-07-25 | 1980-07-25 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5727056A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1041254A (en) * | 1996-07-24 | 1998-02-13 | Sony Corp | Ohmic electrode and forming method thereof |
-
1980
- 1980-07-25 JP JP10279080A patent/JPS5727056A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1041254A (en) * | 1996-07-24 | 1998-02-13 | Sony Corp | Ohmic electrode and forming method thereof |
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