JPS5724945A - Lithographic printing plate and its preparation - Google Patents

Lithographic printing plate and its preparation

Info

Publication number
JPS5724945A
JPS5724945A JP9959780A JP9959780A JPS5724945A JP S5724945 A JPS5724945 A JP S5724945A JP 9959780 A JP9959780 A JP 9959780A JP 9959780 A JP9959780 A JP 9959780A JP S5724945 A JPS5724945 A JP S5724945A
Authority
JP
Japan
Prior art keywords
layer
organopolysiloxane
metal
hardenable
film layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9959780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6158822B2 (cg-RX-API-DMAC10.html
Inventor
Masanori Akata
Hideki Takematsu
Minoru Takamizawa
Yoshio Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Dai Nippon Printing Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP9959780A priority Critical patent/JPS5724945A/ja
Publication of JPS5724945A publication Critical patent/JPS5724945A/ja
Publication of JPS6158822B2 publication Critical patent/JPS6158822B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9959780A 1980-07-21 1980-07-21 Lithographic printing plate and its preparation Granted JPS5724945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9959780A JPS5724945A (en) 1980-07-21 1980-07-21 Lithographic printing plate and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9959780A JPS5724945A (en) 1980-07-21 1980-07-21 Lithographic printing plate and its preparation

Publications (2)

Publication Number Publication Date
JPS5724945A true JPS5724945A (en) 1982-02-09
JPS6158822B2 JPS6158822B2 (cg-RX-API-DMAC10.html) 1986-12-13

Family

ID=14251499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9959780A Granted JPS5724945A (en) 1980-07-21 1980-07-21 Lithographic printing plate and its preparation

Country Status (1)

Country Link
JP (1) JPS5724945A (cg-RX-API-DMAC10.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
EP3390294B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
KR20180095614A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 낮은 OH, Cl, 및 Al 함량을 갖는 석영 유리로 제조된 유리 섬유 및 프리폼
CN108698893A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 于耐火金属熔融坩埚中制备石英玻璃体
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
CN108698890A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 利用在熔融烘箱中的露点监测制备石英玻璃体
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
WO2017103120A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung einer synthetischen quarzglaskörnung

Also Published As

Publication number Publication date
JPS6158822B2 (cg-RX-API-DMAC10.html) 1986-12-13

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