JPS5722241A - Method for making mask in photomechanical process - Google Patents

Method for making mask in photomechanical process

Info

Publication number
JPS5722241A
JPS5722241A JP9740780A JP9740780A JPS5722241A JP S5722241 A JPS5722241 A JP S5722241A JP 9740780 A JP9740780 A JP 9740780A JP 9740780 A JP9740780 A JP 9740780A JP S5722241 A JPS5722241 A JP S5722241A
Authority
JP
Japan
Prior art keywords
positive
subnegative
mask
object image
haltone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9740780A
Other languages
Japanese (ja)
Other versions
JPS6216418B2 (en
Inventor
Tsutomu Hitonaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TAIYOUDOU KK
Original Assignee
TAIYOUDOU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TAIYOUDOU KK filed Critical TAIYOUDOU KK
Priority to JP9740780A priority Critical patent/JPS5722241A/en
Publication of JPS5722241A publication Critical patent/JPS5722241A/en
Publication of JPS6216418B2 publication Critical patent/JPS6216418B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To make a mask in a short time without requiring high degrees of skill by using a positive duplicate film obtained by reducing and printing the image contours of a positive film as a process mask and making a positive halftone plate for background from this. CONSTITUTION:Two sheets of halftone negatives (one is called main negative and the other as subnegative) made by haltone photographing an original picture on lith films are made and the base picture of the remaining part is coated solid with opaque by leaving the object image part of the subnegative thereof. The emulsion film surface of the subnegative coated solid with the opaque at the circumference of the target image part in this way is rubbed with gauze or the like impregnated with a bleaching solution, whereby the film surface of the object image is completely removed. The resultant mask is superposed on the main negative, and these are set together with a printing plate material, and are exposed, whereby the haltone positive plate of the object image part is made.
JP9740780A 1980-07-15 1980-07-15 Method for making mask in photomechanical process Granted JPS5722241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9740780A JPS5722241A (en) 1980-07-15 1980-07-15 Method for making mask in photomechanical process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9740780A JPS5722241A (en) 1980-07-15 1980-07-15 Method for making mask in photomechanical process

Publications (2)

Publication Number Publication Date
JPS5722241A true JPS5722241A (en) 1982-02-05
JPS6216418B2 JPS6216418B2 (en) 1987-04-13

Family

ID=14191638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9740780A Granted JPS5722241A (en) 1980-07-15 1980-07-15 Method for making mask in photomechanical process

Country Status (1)

Country Link
JP (1) JPS5722241A (en)

Also Published As

Publication number Publication date
JPS6216418B2 (en) 1987-04-13

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