JPS57212432A - Photosensitive polymer composition - Google Patents

Photosensitive polymer composition

Info

Publication number
JPS57212432A
JPS57212432A JP9649381A JP9649381A JPS57212432A JP S57212432 A JPS57212432 A JP S57212432A JP 9649381 A JP9649381 A JP 9649381A JP 9649381 A JP9649381 A JP 9649381A JP S57212432 A JPS57212432 A JP S57212432A
Authority
JP
Japan
Prior art keywords
relief pattern
organic group
formula
polymer
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9649381A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0149929B2 (enrdf_load_stackoverflow
Inventor
Fumio Kataoka
Fusaji Shoji
Isao Obara
Ataru Yokono
Tokio Isogai
Mitsumasa Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9649381A priority Critical patent/JPS57212432A/ja
Priority to KR1019810004998A priority patent/KR860000070B1/ko
Priority to GB8137851A priority patent/GB2092164B/en
Priority to FR8123637A priority patent/FR2496111B1/fr
Priority to DE3150054A priority patent/DE3150054C2/de
Priority to US06/331,875 priority patent/US4451551A/en
Publication of JPS57212432A publication Critical patent/JPS57212432A/ja
Publication of JPH0149929B2 publication Critical patent/JPH0149929B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP9649381A 1980-12-17 1981-06-24 Photosensitive polymer composition Granted JPS57212432A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP9649381A JPS57212432A (en) 1981-06-24 1981-06-24 Photosensitive polymer composition
KR1019810004998A KR860000070B1 (ko) 1980-12-17 1981-12-16 광 또는 방사선 감응성 중합체조성물
GB8137851A GB2092164B (en) 1980-12-17 1981-12-16 Loght or radiation-sensitive polymer composition
FR8123637A FR2496111B1 (fr) 1980-12-17 1981-12-17 Composition polymere sensible a la lumiere ou aux radiations, son utilisation pour former des dessins en relief, et composes entrant dans cette composition
DE3150054A DE3150054C2 (de) 1980-12-17 1981-12-17 Licht- oder strahlungsempfindliche Polymerzusammensetzungen und ihre Verwendung
US06/331,875 US4451551A (en) 1980-12-17 1981-12-17 Radiation-sensitive poly(amic acid) polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9649381A JPS57212432A (en) 1981-06-24 1981-06-24 Photosensitive polymer composition

Publications (2)

Publication Number Publication Date
JPS57212432A true JPS57212432A (en) 1982-12-27
JPH0149929B2 JPH0149929B2 (enrdf_load_stackoverflow) 1989-10-26

Family

ID=14166603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9649381A Granted JPS57212432A (en) 1980-12-17 1981-06-24 Photosensitive polymer composition

Country Status (1)

Country Link
JP (1) JPS57212432A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59210939A (ja) * 1983-05-13 1984-11-29 Toyobo Co Ltd 架橋したポリエ−テルイミド成形物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59210939A (ja) * 1983-05-13 1984-11-29 Toyobo Co Ltd 架橋したポリエ−テルイミド成形物

Also Published As

Publication number Publication date
JPH0149929B2 (enrdf_load_stackoverflow) 1989-10-26

Similar Documents

Publication Publication Date Title
US4880722A (en) Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
EP0526650A1 (en) Photosensitive polymer composition and pattern formation
US3072485A (en) Optically sensitized azido polymers for photomechanical resist compositions
JPS598769A (ja) 光重合性コ−テイング剤、光重合性材およびその使用
JPS56114927A (en) Liquid-crystal display element
EP0164100A2 (en) Polymeric pyridinium ylide and products from same
JP2626696B2 (ja) 感光性重合体
Crivello Possibilities for photoimaging using onium salts
ATE53681T1 (de) Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern.
JPS5896654A (ja) 感光性シリコ−ン樹脂組成物
JPS54135525A (en) Photosensitive material
US3817876A (en) Photosensitive polymer and composition
JPS57212432A (en) Photosensitive polymer composition
KR850001443A (ko) 광 저항성 조성물
Chae et al. A water‐developable negative photoresist based on the photocrosslinking of N‐phenylamide groups with reduced environmental impact
EP0917001A1 (en) Negative photoresist compositions and use thereof
JPS5545748A (en) Photosensitive polymer and its production
US1587269A (en) Synthetic resins, photographic process, and media
KR920005732A (ko) 하이드록시페닐 그룹을 갖는 감광성 내열 중합체
ATE7231T1 (de) Herstellung von polyacetylen.
JPS51118716A (en) Process for purification of (meth)acryloyloxyethylammonium salts
JPH06295063A (ja) 化学線感応性重合体組成物
JPS55164825A (en) Polymer positive image forming method
EP0226741A3 (en) Process for producing a positive photoresist
ATE47631T1 (de) Verfahren zum herstellen von photoresiststrukturen.