JPS57210626A - Position controlling system - Google Patents
Position controlling systemInfo
- Publication number
- JPS57210626A JPS57210626A JP56093810A JP9381081A JPS57210626A JP S57210626 A JPS57210626 A JP S57210626A JP 56093810 A JP56093810 A JP 56093810A JP 9381081 A JP9381081 A JP 9381081A JP S57210626 A JPS57210626 A JP S57210626A
- Authority
- JP
- Japan
- Prior art keywords
- delta
- coordinates
- curvature
- measurement
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Abstract
PURPOSE:To obtain correct coordinates, by estimating each mirror curvature in X and Y directions, establishing corrective oblique coordinates against the curvature thereafter, calculating cross coordinates against the oblique coordinates, and relating both coordinates. CONSTITUTION:Three cross patterns 6 are aligned in X-direction at center of measurement 5. There exists a curvature DELTA in the patterns 6 of the measurement 5. As there exists a curvature delta in a mirror 4, the results of measurement show a curvature of delta-DELTA. And, when the measurement 5 is rotated by 180 deg. and mounted, the curvature of patterns 6 of the measurement 5 becomes DELTA in reverse direction. The results of measurement show that of delta+DELTA. Two-fold of the mirror curvature delta can be calculated as a parameter of distance from an origin of coordination, by putting these measurement data together. Oblique coordinates are made after correcting the curvatures deltax(y) and deltay(x). As they have a right angle error theta against cross coordinates, the error is calculated through both coordinates and theta.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56093810A JPS57210626A (en) | 1981-06-19 | 1981-06-19 | Position controlling system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56093810A JPS57210626A (en) | 1981-06-19 | 1981-06-19 | Position controlling system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57210626A true JPS57210626A (en) | 1982-12-24 |
Family
ID=14092751
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56093810A Pending JPS57210626A (en) | 1981-06-19 | 1981-06-19 | Position controlling system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57210626A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0684753A (en) * | 1992-09-04 | 1994-03-25 | Nikon Corp | Exposing method |
-
1981
- 1981-06-19 JP JP56093810A patent/JPS57210626A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0684753A (en) * | 1992-09-04 | 1994-03-25 | Nikon Corp | Exposing method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0252283B2 (en) | ||
SE9400579L (en) | Procedure for controlling the movement of an industrial robot in and around singularities | |
CA2221339A1 (en) | Method and apparatus for navigating with correction of angular speed using azimuth detection sensor | |
JPS61281305A (en) | Articulated robot control device | |
WO2003081168A3 (en) | Method for determining and correcting guiding errors in a coordinate measuring device | |
CN110001998A (en) | A kind of Large Aircraft Components frame structure docking guide device and method based on laser ranging | |
JPS6464753A (en) | Noncontact copying method | |
JPS57210626A (en) | Position controlling system | |
CN104907376A (en) | Flame way planning method for line heating torsion plates | |
EP0237578A4 (en) | Method of forming composite curved surface. | |
JPS62194513A (en) | Controller for arc interpolation posture of robot | |
JPS5740927A (en) | Exposing method of electron beam | |
JPS55145937A (en) | Method and device for initial setting of bucket wheel of reclaimer | |
JPS6249417A (en) | Positioning device | |
CN110837689A (en) | Method and device for controlling positioning accuracy of closure opening aggregate and outer plate | |
JP2961152B2 (en) | Shield excavation method | |
JPS5672705A (en) | Profiling work system | |
JPS57192029A (en) | Mask set and positioning method for mask | |
KR970005539A (en) | Axial deflection correction method for gantry handling robot | |
JPS57192028A (en) | Mask set and positioning method for mask | |
JPS6463918A (en) | Photoplotter | |
JPH06782A (en) | Position control method for robot | |
JPS63144950A (en) | Control method for grinding robot | |
JPS57125087A (en) | Thick film printing | |
Sadre et al. | Coordinate transformations for two industrial robots |