JPS57208125A - Method and apparatus for manufacturing thin film - Google Patents
Method and apparatus for manufacturing thin filmInfo
- Publication number
- JPS57208125A JPS57208125A JP9425981A JP9425981A JPS57208125A JP S57208125 A JPS57208125 A JP S57208125A JP 9425981 A JP9425981 A JP 9425981A JP 9425981 A JP9425981 A JP 9425981A JP S57208125 A JPS57208125 A JP S57208125A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- thin film
- gas
- gap
- anode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9425981A JPS57208125A (en) | 1981-06-17 | 1981-06-17 | Method and apparatus for manufacturing thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9425981A JPS57208125A (en) | 1981-06-17 | 1981-06-17 | Method and apparatus for manufacturing thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57208125A true JPS57208125A (en) | 1982-12-21 |
Family
ID=14105282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9425981A Pending JPS57208125A (en) | 1981-06-17 | 1981-06-17 | Method and apparatus for manufacturing thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57208125A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5312778A (en) * | 1989-10-03 | 1994-05-17 | Applied Materials, Inc. | Method for plasma processing using magnetically enhanced plasma chemical vapor deposition |
JP2016106359A (ja) * | 2010-07-15 | 2016-06-16 | 太陽誘電ケミカルテクノロジー株式会社 | プラズマ発生方法及びそのための装置 |
-
1981
- 1981-06-17 JP JP9425981A patent/JPS57208125A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5312778A (en) * | 1989-10-03 | 1994-05-17 | Applied Materials, Inc. | Method for plasma processing using magnetically enhanced plasma chemical vapor deposition |
JP2016106359A (ja) * | 2010-07-15 | 2016-06-16 | 太陽誘電ケミカルテクノロジー株式会社 | プラズマ発生方法及びそのための装置 |
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