JPS57207850A - Monitoring apparatus of plasma luminous distribution - Google Patents

Monitoring apparatus of plasma luminous distribution

Info

Publication number
JPS57207850A
JPS57207850A JP9232981A JP9232981A JPS57207850A JP S57207850 A JPS57207850 A JP S57207850A JP 9232981 A JP9232981 A JP 9232981A JP 9232981 A JP9232981 A JP 9232981A JP S57207850 A JPS57207850 A JP S57207850A
Authority
JP
Japan
Prior art keywords
plasma beam
window
distribution
lens system
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9232981A
Other languages
Japanese (ja)
Inventor
Hisajiro Osada
Yutaka Hiratsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9232981A priority Critical patent/JPS57207850A/en
Publication of JPS57207850A publication Critical patent/JPS57207850A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0018—Details

Abstract

PURPOSE:To monitor a plasma beam at every optional luminous position, by moving a lens system for plasma beam condensing and also, moving the lens system and an optical fiber for light introduction to an optical window in parallel. CONSTITUTION:A movement of a lens system 7 for plasma beam condensing through an observation window 5 and scanning movement in the face parallel to the window 5 of the system 7 and an optical fiber 9 for light introduction, are controlled by an electromotive focus moving mechanism 8 and an electromotive scanning mechanism controlling through a controller 11. Further, introduced light of the fiber 9 is supplied to a spectral mechanism 12 and is processed by a light detection mechanism 13, a data processing means 14 and a display means 15 etc. and then, the distribution of plasm luminescence observed from the window 5 is monitored not only the surface distribution but also the distribution in a depth direction. Hereby, a plasma beam is monitored at every optional position of luminescence.
JP9232981A 1981-06-17 1981-06-17 Monitoring apparatus of plasma luminous distribution Pending JPS57207850A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9232981A JPS57207850A (en) 1981-06-17 1981-06-17 Monitoring apparatus of plasma luminous distribution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9232981A JPS57207850A (en) 1981-06-17 1981-06-17 Monitoring apparatus of plasma luminous distribution

Publications (1)

Publication Number Publication Date
JPS57207850A true JPS57207850A (en) 1982-12-20

Family

ID=14051345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9232981A Pending JPS57207850A (en) 1981-06-17 1981-06-17 Monitoring apparatus of plasma luminous distribution

Country Status (1)

Country Link
JP (1) JPS57207850A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4541718A (en) * 1982-01-12 1985-09-17 Hitachi, Ltd. Plasma monitoring method and plasma monitor
JPS6221041A (en) * 1985-07-19 1987-01-29 Chino Corp Optical measuring apparatus
US5654796A (en) * 1995-12-22 1997-08-05 Lam Research Corporation Apparatus and method for mapping plasma characteristics

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4541718A (en) * 1982-01-12 1985-09-17 Hitachi, Ltd. Plasma monitoring method and plasma monitor
JPS6221041A (en) * 1985-07-19 1987-01-29 Chino Corp Optical measuring apparatus
US5654796A (en) * 1995-12-22 1997-08-05 Lam Research Corporation Apparatus and method for mapping plasma characteristics

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