JPS57199230A - Method of measuring length of circuit pattern in semiconductor wafer using scanning type electron microscope and apparatus therefor - Google Patents

Method of measuring length of circuit pattern in semiconductor wafer using scanning type electron microscope and apparatus therefor

Info

Publication number
JPS57199230A
JPS57199230A JP8411981A JP8411981A JPS57199230A JP S57199230 A JPS57199230 A JP S57199230A JP 8411981 A JP8411981 A JP 8411981A JP 8411981 A JP8411981 A JP 8411981A JP S57199230 A JPS57199230 A JP S57199230A
Authority
JP
Japan
Prior art keywords
circuit pattern
electron microscope
type electron
scanning type
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8411981A
Other languages
Japanese (ja)
Inventor
Seiichiro Satomura
Hideaki Yanai
Mitsuhisa Miyazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akashi Seisakusho KK
Original Assignee
Akashi Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akashi Seisakusho KK filed Critical Akashi Seisakusho KK
Priority to JP8411981A priority Critical patent/JPS57199230A/en
Publication of JPS57199230A publication Critical patent/JPS57199230A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To measure length automatically and accurately, by a method wherein image of circuit pattern is displayed on a screen of a Braun tube, a marker is moved to corresponding portion between two points, and electric signal for generating the marker or the like is used. CONSTITUTION:Image of a circuit pattern is displayed on a screen 5a of a Btaun tube 5 using a scanning type electron microscope. On the screen 5a, a marker MK displayed by brightness modulation is moved to corresponding portion between two points in the circuit pattern image. Length between required two points in the circuit pattern is measured by electric signal for generating the marker MK and electric signal corresponding to the image between two points.
JP8411981A 1981-06-01 1981-06-01 Method of measuring length of circuit pattern in semiconductor wafer using scanning type electron microscope and apparatus therefor Pending JPS57199230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8411981A JPS57199230A (en) 1981-06-01 1981-06-01 Method of measuring length of circuit pattern in semiconductor wafer using scanning type electron microscope and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8411981A JPS57199230A (en) 1981-06-01 1981-06-01 Method of measuring length of circuit pattern in semiconductor wafer using scanning type electron microscope and apparatus therefor

Publications (1)

Publication Number Publication Date
JPS57199230A true JPS57199230A (en) 1982-12-07

Family

ID=13821624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8411981A Pending JPS57199230A (en) 1981-06-01 1981-06-01 Method of measuring length of circuit pattern in semiconductor wafer using scanning type electron microscope and apparatus therefor

Country Status (1)

Country Link
JP (1) JPS57199230A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661604A (en) * 1979-10-25 1981-05-27 Jeol Ltd Range finder in scanning electronic microscope

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661604A (en) * 1979-10-25 1981-05-27 Jeol Ltd Range finder in scanning electronic microscope

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