JPS5719379A - Dry etching device having upper water cooled electrode - Google Patents

Dry etching device having upper water cooled electrode

Info

Publication number
JPS5719379A
JPS5719379A JP9426680A JP9426680A JPS5719379A JP S5719379 A JPS5719379 A JP S5719379A JP 9426680 A JP9426680 A JP 9426680A JP 9426680 A JP9426680 A JP 9426680A JP S5719379 A JPS5719379 A JP S5719379A
Authority
JP
Japan
Prior art keywords
substrate
etched
dry etching
plate
upper water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9426680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6248758B2 (cg-RX-API-DMAC7.html
Inventor
Yuji Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP9426680A priority Critical patent/JPS5719379A/ja
Publication of JPS5719379A publication Critical patent/JPS5719379A/ja
Publication of JPS6248758B2 publication Critical patent/JPS6248758B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP9426680A 1980-07-09 1980-07-09 Dry etching device having upper water cooled electrode Granted JPS5719379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9426680A JPS5719379A (en) 1980-07-09 1980-07-09 Dry etching device having upper water cooled electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9426680A JPS5719379A (en) 1980-07-09 1980-07-09 Dry etching device having upper water cooled electrode

Publications (2)

Publication Number Publication Date
JPS5719379A true JPS5719379A (en) 1982-02-01
JPS6248758B2 JPS6248758B2 (cg-RX-API-DMAC7.html) 1987-10-15

Family

ID=14105469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9426680A Granted JPS5719379A (en) 1980-07-09 1980-07-09 Dry etching device having upper water cooled electrode

Country Status (1)

Country Link
JP (1) JPS5719379A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61260637A (ja) * 1985-05-15 1986-11-18 Mitsubishi Electric Corp ドライエツチング装置
JPH01186621A (ja) * 1987-07-16 1989-07-26 Texas Instr Inc <Ti> 処理装置及び方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61260637A (ja) * 1985-05-15 1986-11-18 Mitsubishi Electric Corp ドライエツチング装置
JPH01186621A (ja) * 1987-07-16 1989-07-26 Texas Instr Inc <Ti> 処理装置及び方法

Also Published As

Publication number Publication date
JPS6248758B2 (cg-RX-API-DMAC7.html) 1987-10-15

Similar Documents

Publication Publication Date Title
EP0635872A3 (cg-RX-API-DMAC7.html)
JPS5719379A (en) Dry etching device having upper water cooled electrode
JPS56113115A (en) Sample table for immersion system microscope
JPS56131930A (en) Controlling device of wafer temperature
JPS5437581A (en) Wafer etching device
JPS558055A (en) Liquid phase breeding
JPS547288A (en) Observation window for sealed container
JPS56139101A (en) Vapor-liquid contacting apparatus
JPS556318A (en) Polarizing plate affixing device
JPS5553437A (en) Semiconductor wafer dividing method and its apparatus
JPS6474393A (en) Steam remover for steam trap
RU1770371C (ru) Поднасадочное устройство воздухонагревател доменной печи
JPS5375866A (en) Wafer transfer device
JPS5792850A (en) Semiconductor chip
JPS5751287A (en) Plating apparatus
JPS54131872A (en) Forming method for dielectric layer of semiconductor device
JPS54105859A (en) Cleaner
JPS5612765A (en) Mos dynamic memory cell
JPS5719525A (en) Temperature sensor for kitchen range
JPS54160990A (en) Reactor housing device
JPS53137873A (en) Reaction method and its device
JPS5544734A (en) Semiconductor device
JPS5431517A (en) Construction for linear motor secondary plate
JPS53147479A (en) Production of semiconductor device
KR910005434A (ko) 저압화학증착비용 고온 배기가스의 냉각장치