JPS57193023A - Heater assembly - Google Patents
Heater assemblyInfo
- Publication number
- JPS57193023A JPS57193023A JP7809381A JP7809381A JPS57193023A JP S57193023 A JPS57193023 A JP S57193023A JP 7809381 A JP7809381 A JP 7809381A JP 7809381 A JP7809381 A JP 7809381A JP S57193023 A JPS57193023 A JP S57193023A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heat source
- source substance
- temperature
- soaking plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Abstract
PURPOSE:To exactly measure substrate temperature for control by a method wherein an oscillating heat source substance having a heater and a cooling channel is freely connected to a support member and the whole part of the heat source substance is sealed in a vacuum container so that the heat source substance may vertically move to the surface of a substrate and the heating efficiency of the substrate is increased. CONSTITUTION:With a substrate 2 placed on a substrate holder 3 and a support member 6 dropped to the upper surface of the substrate 2, a heat source substance 7 also descends. A soaking plate 10 abuts onthe substrate 2 by arriving the heat source substance 7 at a predetermined position and the soaking plate 10 closely contacts with the substrate 2 by corresponding to the surface of the substrate 2 with an action by piano wire 11 or disc plate spring 15. The heat source substance 7 is heated up to a predetermined temperature while measuring the temperature by thermocouple 13. For cooling, cooling water is supplied to a channel 9 under the same condition. The substrate and the heat source substance are closely contacted under vacuum condition. Therefore, good heating efficiency of the subrate can be obtained. The surface of the soaking plate is of the same material as that of the substrate and a temperature sensed element buried the thermocouple is screwed to have the same contact condition as that of the substrate and exact temperature measurement and control can be performed with easy installation and high reproducibility.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7809381A JPS57193023A (en) | 1981-05-25 | 1981-05-25 | Heater assembly |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7809381A JPS57193023A (en) | 1981-05-25 | 1981-05-25 | Heater assembly |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57193023A true JPS57193023A (en) | 1982-11-27 |
JPH0122722B2 JPH0122722B2 (en) | 1989-04-27 |
Family
ID=13652240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7809381A Granted JPS57193023A (en) | 1981-05-25 | 1981-05-25 | Heater assembly |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57193023A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63143256A (en) * | 1986-12-04 | 1988-06-15 | Anelva Corp | Sputtering device |
JPS63137932U (en) * | 1987-03-02 | 1988-09-12 |
-
1981
- 1981-05-25 JP JP7809381A patent/JPS57193023A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63143256A (en) * | 1986-12-04 | 1988-06-15 | Anelva Corp | Sputtering device |
JPS63137932U (en) * | 1987-03-02 | 1988-09-12 |
Also Published As
Publication number | Publication date |
---|---|
JPH0122722B2 (en) | 1989-04-27 |
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