JPS57192948A - Resist material - Google Patents

Resist material

Info

Publication number
JPS57192948A
JPS57192948A JP7896881A JP7896881A JPS57192948A JP S57192948 A JPS57192948 A JP S57192948A JP 7896881 A JP7896881 A JP 7896881A JP 7896881 A JP7896881 A JP 7896881A JP S57192948 A JPS57192948 A JP S57192948A
Authority
JP
Japan
Prior art keywords
resist material
vinylnaphthalene
chlorostyrene
copolymer
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7896881A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033215B2 (enrdf_load_stackoverflow
Inventor
Yoshitake Onishi
Takeshi Endo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7896881A priority Critical patent/JPS57192948A/ja
Priority to DE8181109526T priority patent/DE3174780D1/de
Priority to EP81109526A priority patent/EP0051320B1/en
Publication of JPS57192948A publication Critical patent/JPS57192948A/ja
Priority to US06/787,695 priority patent/US4592993A/en
Publication of JPH033215B2 publication Critical patent/JPH033215B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP7896881A 1980-11-05 1981-05-25 Resist material Granted JPS57192948A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7896881A JPS57192948A (en) 1981-05-25 1981-05-25 Resist material
DE8181109526T DE3174780D1 (en) 1980-11-05 1981-11-05 Radiation-sensitive negative resist
EP81109526A EP0051320B1 (en) 1980-11-05 1981-11-05 Radiation-sensitive negative resist
US06/787,695 US4592993A (en) 1980-11-05 1985-10-15 Pattern forming and etching process using radiation sensitive negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7896881A JPS57192948A (en) 1981-05-25 1981-05-25 Resist material

Publications (2)

Publication Number Publication Date
JPS57192948A true JPS57192948A (en) 1982-11-27
JPH033215B2 JPH033215B2 (enrdf_load_stackoverflow) 1991-01-18

Family

ID=13676695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7896881A Granted JPS57192948A (en) 1980-11-05 1981-05-25 Resist material

Country Status (1)

Country Link
JP (1) JPS57192948A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH033215B2 (enrdf_load_stackoverflow) 1991-01-18

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