JPS57192947A - Resist material - Google Patents

Resist material

Info

Publication number
JPS57192947A
JPS57192947A JP56078967A JP7896781A JPS57192947A JP S57192947 A JPS57192947 A JP S57192947A JP 56078967 A JP56078967 A JP 56078967A JP 7896781 A JP7896781 A JP 7896781A JP S57192947 A JPS57192947 A JP S57192947A
Authority
JP
Japan
Prior art keywords
resist material
chloromethylstyrene
vinylnaphthalene
copolymer
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56078967A
Other languages
Japanese (ja)
Other versions
JPH033214B2 (en
Inventor
Yoshitake Onishi
Takeshi Endo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56078967A priority Critical patent/JPS57192947A/en
Priority to EP81109526A priority patent/EP0051320B1/en
Priority to DE8181109526T priority patent/DE3174780D1/en
Publication of JPS57192947A publication Critical patent/JPS57192947A/en
Priority to US06/787,695 priority patent/US4592993A/en
Publication of JPH033214B2 publication Critical patent/JPH033214B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain a resist material good in dry-etching resistance and easy to prepare, by using a copolymer of vinylnaphthalene and chloromethylstyrene as a material sensitive to radiation and corpuscular beams. CONSTITUTION:A copolymer of vinylnaphthalene V and chloromethylstyrene C is used as a material sensitive to radiation and corpuscular beams. A suitable copolymerization ratio of V/C by weight is (95-50):(5-50), and a suitable average mol.wt. is 10,000-1,000,000.
JP56078967A 1980-11-05 1981-05-25 Resist material Granted JPS57192947A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP56078967A JPS57192947A (en) 1981-05-25 1981-05-25 Resist material
EP81109526A EP0051320B1 (en) 1980-11-05 1981-11-05 Radiation-sensitive negative resist
DE8181109526T DE3174780D1 (en) 1980-11-05 1981-11-05 Radiation-sensitive negative resist
US06/787,695 US4592993A (en) 1980-11-05 1985-10-15 Pattern forming and etching process using radiation sensitive negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56078967A JPS57192947A (en) 1981-05-25 1981-05-25 Resist material

Publications (2)

Publication Number Publication Date
JPS57192947A true JPS57192947A (en) 1982-11-27
JPH033214B2 JPH033214B2 (en) 1991-01-18

Family

ID=13676668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56078967A Granted JPS57192947A (en) 1980-11-05 1981-05-25 Resist material

Country Status (1)

Country Link
JP (1) JPS57192947A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (en) * 1983-11-29 1985-06-22 Fujitsu Ltd Forming method of negative type resist pattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (en) * 1983-11-29 1985-06-22 Fujitsu Ltd Forming method of negative type resist pattern
JPH0318179B2 (en) * 1983-11-29 1991-03-11 Fujitsu Ltd

Also Published As

Publication number Publication date
JPH033214B2 (en) 1991-01-18

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