JPS57192026A - Chucking device for mask - Google Patents

Chucking device for mask

Info

Publication number
JPS57192026A
JPS57192026A JP7697381A JP7697381A JPS57192026A JP S57192026 A JPS57192026 A JP S57192026A JP 7697381 A JP7697381 A JP 7697381A JP 7697381 A JP7697381 A JP 7697381A JP S57192026 A JPS57192026 A JP S57192026A
Authority
JP
Japan
Prior art keywords
mask
substrate
chucking
central direction
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7697381A
Other languages
Japanese (ja)
Other versions
JPS6152974B2 (en
Inventor
Hisao Haruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7697381A priority Critical patent/JPS57192026A/en
Publication of JPS57192026A publication Critical patent/JPS57192026A/en
Publication of JPS6152974B2 publication Critical patent/JPS6152974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To equalize a volatile temperature on a mask substrate, and to make the thickness of a resist film uniform by moving a mask chucking section in the central direction of a shaft through the revolution of the mask chucking device and pushing the mask substrate. CONSTITUTION:Weights 7 connected to mask chucking sections 4 by wires 5 are mounted to each side of a mask substrate 3 while being opposed to the maks chucking sections 4, which can be moved in the central direction of the rotary axis of the substrate 3 and are contacted with one sides of the substrate 3. When spin revolution is started, the chucking sections 4 are moved in the central direction of a fixed axis by the wires 5 connected to the weights 7 having centrifugal force through revolution, and the substrate 3 is pushed against the central direction of the axis from four directions. The center of the substrate 3 is aligned at the center of the axis because the weight of the weights 7 is equal.
JP7697381A 1981-05-21 1981-05-21 Chucking device for mask Granted JPS57192026A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7697381A JPS57192026A (en) 1981-05-21 1981-05-21 Chucking device for mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7697381A JPS57192026A (en) 1981-05-21 1981-05-21 Chucking device for mask

Publications (2)

Publication Number Publication Date
JPS57192026A true JPS57192026A (en) 1982-11-26
JPS6152974B2 JPS6152974B2 (en) 1986-11-15

Family

ID=13620721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7697381A Granted JPS57192026A (en) 1981-05-21 1981-05-21 Chucking device for mask

Country Status (1)

Country Link
JP (1) JPS57192026A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS637204A (en) * 1986-05-16 1988-01-13 シリコン・バレ−・グル−プ・インコ−ポレイテツド Balancing mechanism for movable jaw chuck of spin station

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS637204A (en) * 1986-05-16 1988-01-13 シリコン・バレ−・グル−プ・インコ−ポレイテツド Balancing mechanism for movable jaw chuck of spin station

Also Published As

Publication number Publication date
JPS6152974B2 (en) 1986-11-15

Similar Documents

Publication Publication Date Title
JPS51137299A (en) Crack monitoring device of a rotor
JPS57192026A (en) Chucking device for mask
JPS5643125A (en) Assorting device
JPS5247836A (en) Spin coater
JPS57157075A (en) Gravitational power generator
JPS5797940A (en) Method of fabrication of flywheel
JPS51130972A (en) Method of centrifugal separator operation
JPS5595847A (en) Centrifugal force control type exciter
JPS5318968A (en) Semiconductor wafer arraying device
JPS5318965A (en) Resist coating method
JPS56116923A (en) Equal velocity joint
JPS56142022A (en) Centrifugal molding device
JPS51140214A (en) Capacity rotator
JPS5619761A (en) Sheet clamping device
JPS55129701A (en) Size measuring unit
JPS56112724A (en) Spinner head
JPS51151466A (en) Vacuum deaeration apparatus in the flywheel casing
JPS5267704A (en) Rotor of vertical type rotary machine
JPS55156701A (en) Wheel mounting device for wheel balancer
JPS52146817A (en) Hysteresis motor
JPS51140048A (en) Pivot bearing device
JPS578370A (en) Power generator utilizing terrestrial gravitation
JPS6491135A (en) Method for forming thick film of photoresist
JPS55165817A (en) Device for controlling posture of fruit
JPS5351801A (en) Free wheel hub device