JPS57187851A - Secondary ion mass analyzing unit - Google Patents
Secondary ion mass analyzing unitInfo
- Publication number
- JPS57187851A JPS57187851A JP56072514A JP7251481A JPS57187851A JP S57187851 A JPS57187851 A JP S57187851A JP 56072514 A JP56072514 A JP 56072514A JP 7251481 A JP7251481 A JP 7251481A JP S57187851 A JPS57187851 A JP S57187851A
- Authority
- JP
- Japan
- Prior art keywords
- light
- sample
- semitransparent mirror
- reflected
- receiving face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 abstract 4
- 238000009826 distribution Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 238000004157 plasmatron Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56072514A JPS57187851A (en) | 1981-05-14 | 1981-05-14 | Secondary ion mass analyzing unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56072514A JPS57187851A (en) | 1981-05-14 | 1981-05-14 | Secondary ion mass analyzing unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57187851A true JPS57187851A (en) | 1982-11-18 |
| JPH027510B2 JPH027510B2 (OSRAM) | 1990-02-19 |
Family
ID=13491517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56072514A Granted JPS57187851A (en) | 1981-05-14 | 1981-05-14 | Secondary ion mass analyzing unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57187851A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012007832A1 (en) * | 2010-07-14 | 2012-01-19 | University Of Cape Town | Depth control of laser cutter |
-
1981
- 1981-05-14 JP JP56072514A patent/JPS57187851A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012007832A1 (en) * | 2010-07-14 | 2012-01-19 | University Of Cape Town | Depth control of laser cutter |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH027510B2 (OSRAM) | 1990-02-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0085981B1 (en) | Method of and apparatus for determining the refractive-index profile of optical fibres and optical-fibre preforms | |
| TW331587B (en) | Optical differential profile measurement apparatus and process | |
| GB1493967A (en) | Method of and apparatus for measuring the width of an elongated element | |
| JPS5590843A (en) | Method of measuring contaminated gas | |
| US3857636A (en) | Measurement of phase profile across a high power laser beam | |
| US4452071A (en) | Measurement of fill gas pressure in light bulbs | |
| JP2732849B2 (ja) | 干渉測長器 | |
| UST102104I4 (en) | Scanning optical system adapted for linewidth measurement in semiconductor devices | |
| DE3471368D1 (en) | Interferometric thickness analyzer and measuring method | |
| US4208129A (en) | Sensitive laser spectroscopy measurement system | |
| JP2533514B2 (ja) | 凹部深さ・膜厚測定装置 | |
| US3628866A (en) | Noncontacting method of measuring strain | |
| JP3131242B2 (ja) | 光ビーム入射角の測定方法、測定装置及び該装置を距離測定に使用する方法 | |
| JPS57187851A (en) | Secondary ion mass analyzing unit | |
| JPH0695114B2 (ja) | 電圧検出装置 | |
| US2849912A (en) | Optical arrangement for determining the ratio of two light fluxes | |
| RU2060475C1 (ru) | Способ измерения амплитуд гармонических колебаний | |
| US7046373B2 (en) | Interferometric system for the simultaneous measurement of the index of refraction and of the thickness of transparent materials, and related procedure | |
| Lunazzi et al. | Fabry-Perot laser interferometry to measure refractive index or thickness of transparent materials | |
| SU861936A1 (ru) | Способ измерени поперечных размеров и глубины щели в объектах | |
| JPS5610201A (en) | Object dimension measuring device | |
| SU987864A1 (ru) | Способ измерени плотности электронов в пучке | |
| EP0228702B1 (en) | Interferometer including stationary, electrically alterable, optical masking device | |
| Veselov et al. | Use of the Multiple-Beam Interferometry in Measurement of Shells for Laser Fusion Targets | |
| SU935701A1 (ru) | Устройство дл контрол оптических систем |