JPS57187311A - Production of novolak type phenol resin having extremely wide molecular weight distribution - Google Patents
Production of novolak type phenol resin having extremely wide molecular weight distributionInfo
- Publication number
- JPS57187311A JPS57187311A JP7014081A JP7014081A JPS57187311A JP S57187311 A JPS57187311 A JP S57187311A JP 7014081 A JP7014081 A JP 7014081A JP 7014081 A JP7014081 A JP 7014081A JP S57187311 A JPS57187311 A JP S57187311A
- Authority
- JP
- Japan
- Prior art keywords
- average
- reaction
- solvent
- condensation reaction
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
Abstract
PURPOSE: To obtain the titled resin having a high average MW and a wide MW distribution, by carrying out a condensation reaction and an MW-increasing reaction of a dihydric phenol and a large excess of formaldehyde in two stages in a solvent in the presence of a weakly acidic catalyst.
CONSTITUTION: A reaction tank is charged with a highly reactive dihydric phenol (e.g., o-cresol, 2,3-xylenol), a large excess of formaldehyde, a solvent (e.g., benzene, ethylene glycol) and a weakly acidic catalyst (e.g., oxalic acid). Then, the primary condensation reaction is carried out by gradually dehydrating the mixture under reflux, and the secondary condensation reaction is carried out by gradually dehydrating the mixture under reflux at a slightly higher temperature for a long time while adding an additional solvent. Next, the reaction is continued until the viscosity of the system increases to an extremely high value, and the whole system becomes a uniform soft jelly, producing a resin, number-average MW ≥1,000, weight-average MW/logarithmic average MW ≥20.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7014081A JPS57187311A (en) | 1981-05-12 | 1981-05-12 | Production of novolak type phenol resin having extremely wide molecular weight distribution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7014081A JPS57187311A (en) | 1981-05-12 | 1981-05-12 | Production of novolak type phenol resin having extremely wide molecular weight distribution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57187311A true JPS57187311A (en) | 1982-11-18 |
| JPS617211B2 JPS617211B2 (en) | 1986-03-05 |
Family
ID=13422964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7014081A Granted JPS57187311A (en) | 1981-05-12 | 1981-05-12 | Production of novolak type phenol resin having extremely wide molecular weight distribution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57187311A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994015259A1 (en) * | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Resin compositions for photoresist applications |
| US5986035A (en) * | 1997-04-15 | 1999-11-16 | Sumitomo Bakelite Company Limited | High-molecular weight high-ortho novolak type phenolic resin |
-
1981
- 1981-05-12 JP JP7014081A patent/JPS57187311A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994015259A1 (en) * | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Resin compositions for photoresist applications |
| US5986035A (en) * | 1997-04-15 | 1999-11-16 | Sumitomo Bakelite Company Limited | High-molecular weight high-ortho novolak type phenolic resin |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS617211B2 (en) | 1986-03-05 |
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