JPS57173942A - Formation of resist pattern for fine processing - Google Patents

Formation of resist pattern for fine processing

Info

Publication number
JPS57173942A
JPS57173942A JP5909781A JP5909781A JPS57173942A JP S57173942 A JPS57173942 A JP S57173942A JP 5909781 A JP5909781 A JP 5909781A JP 5909781 A JP5909781 A JP 5909781A JP S57173942 A JPS57173942 A JP S57173942A
Authority
JP
Japan
Prior art keywords
pattern
rays
irradiation
fine processing
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5909781A
Other languages
Japanese (ja)
Inventor
Yoshio Yamashita
Mitsumasa Kunishi
Takaharu Kawazu
Seigo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP5909781A priority Critical patent/JPS57173942A/en
Publication of JPS57173942A publication Critical patent/JPS57173942A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enhance resolving power of a resist pattern for fine processing by a method wherein an organic film consisting of a polymer containing epoxy radical is formed on a substrate, far ultraviolet rays are irradiated thereto to form the pattern, and after X rays are irradiated in the lump moreover, aromatic amine is impregnated therein. CONSTITUTION:The organic film consisting of the polymer containing epoxy radical is formed on a substrate, and irradiation of far ultraviolet rays are performed thereon to form the pattern. Then the irradiation treatment of electron rays having 1muC/cm<2> or more of irradiating quantity or X rays having 10mJ/ cm<2> or more of irradiating quantity is performed in a lump on the pattern thereof. Then aromatic amine or aromatic acid anhydride is impregnated in the pattern thereof. When irradiation of electron rays or X rays is performed by this way with the prescribed quantity as the pretreatment before impregnation is to be performed, the thermal bridging treatment for prevention of swelling of the pattern can be performed as favorably, and the pattern having high resolving power can be obtained.
JP5909781A 1981-04-21 1981-04-21 Formation of resist pattern for fine processing Pending JPS57173942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5909781A JPS57173942A (en) 1981-04-21 1981-04-21 Formation of resist pattern for fine processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5909781A JPS57173942A (en) 1981-04-21 1981-04-21 Formation of resist pattern for fine processing

Publications (1)

Publication Number Publication Date
JPS57173942A true JPS57173942A (en) 1982-10-26

Family

ID=13103483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5909781A Pending JPS57173942A (en) 1981-04-21 1981-04-21 Formation of resist pattern for fine processing

Country Status (1)

Country Link
JP (1) JPS57173942A (en)

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