JPS57170842A - Surface treatment - Google Patents

Surface treatment

Info

Publication number
JPS57170842A
JPS57170842A JP5383981A JP5383981A JPS57170842A JP S57170842 A JPS57170842 A JP S57170842A JP 5383981 A JP5383981 A JP 5383981A JP 5383981 A JP5383981 A JP 5383981A JP S57170842 A JPS57170842 A JP S57170842A
Authority
JP
Japan
Prior art keywords
substrate
pva
polishing
polished
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5383981A
Other languages
Japanese (ja)
Inventor
Atsushi Miyahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5383981A priority Critical patent/JPS57170842A/en
Publication of JPS57170842A publication Critical patent/JPS57170842A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To form protective films preventing the sticking of foreign matter and the formation of a compound layer and capable of being simply removed on the surfaces of a substrate by solidifying a PVA soln. used to polish the substrate by drying after finishing the final polishing.
CONSTITUTION: Each rough polished glass substrate 3 for forming a photomask is finally polished with a both-side lapping apparatus composed of strictly flattened lower and upper tables 1, 2 and a carrier 4 made of metallic plate which is thinner than the substrate 3 to be treated and provided with the function of conducting rotation and revolution while guiding the substrate 3. The substrate 3 is mounted in the carrier 4 between the tables 1, 2, about 3kg/cm2 pressure is applied from the table 2, and the substrate 3 is polished while injecting a polishing liq. 5 prepared by adding about 10wt% Zr powder to an about 5% aqueous PVA soln. After finishing the polishing, the PVA soln. on the substrate 3 is freed of water by drying to form protective films of solid PVA contg. the abrasive on the surfaces of the substrate 3.
COPYRIGHT: (C)1982,JPO&Japio
JP5383981A 1981-04-10 1981-04-10 Surface treatment Pending JPS57170842A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5383981A JPS57170842A (en) 1981-04-10 1981-04-10 Surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5383981A JPS57170842A (en) 1981-04-10 1981-04-10 Surface treatment

Publications (1)

Publication Number Publication Date
JPS57170842A true JPS57170842A (en) 1982-10-21

Family

ID=12953946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5383981A Pending JPS57170842A (en) 1981-04-10 1981-04-10 Surface treatment

Country Status (1)

Country Link
JP (1) JPS57170842A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114315424A (en) * 2022-01-14 2022-04-12 江西宁新新材料股份有限公司 Preparation method of high-temperature-resistant coating and application of high-temperature-resistant coating in graphite product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114315424A (en) * 2022-01-14 2022-04-12 江西宁新新材料股份有限公司 Preparation method of high-temperature-resistant coating and application of high-temperature-resistant coating in graphite product
CN114315424B (en) * 2022-01-14 2022-10-21 江西宁新新材料股份有限公司 Preparation method of high-temperature-resistant coating and application of high-temperature-resistant coating in graphite product

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