JPS57164595A - Method and device for producing printed circuit board - Google Patents

Method and device for producing printed circuit board

Info

Publication number
JPS57164595A
JPS57164595A JP57003546A JP354682A JPS57164595A JP S57164595 A JPS57164595 A JP S57164595A JP 57003546 A JP57003546 A JP 57003546A JP 354682 A JP354682 A JP 354682A JP S57164595 A JPS57164595 A JP S57164595A
Authority
JP
Japan
Prior art keywords
circuit board
printed circuit
producing printed
producing
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57003546A
Other languages
English (en)
Inventor
Jiyon Rendouritsuku Furanshisu
Konsutanto Torasabeeji Robaato
Arubaatobodatsuku Pooru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co
Original Assignee
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co filed Critical WR Grace and Co
Publication of JPS57164595A publication Critical patent/JPS57164595A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57003546A 1981-01-16 1982-01-14 Method and device for producing printed circuit board Pending JPS57164595A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22581081A 1981-01-16 1981-01-16

Publications (1)

Publication Number Publication Date
JPS57164595A true JPS57164595A (en) 1982-10-09

Family

ID=22846343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57003546A Pending JPS57164595A (en) 1981-01-16 1982-01-14 Method and device for producing printed circuit board

Country Status (11)

Country Link
JP (1) JPS57164595A (ja)
AU (1) AU557941B2 (ja)
CA (1) CA1158091A (ja)
DE (1) DE3201577A1 (ja)
FR (1) FR2498410B1 (ja)
GB (3) GB2091493B (ja)
IT (1) IT1196537B (ja)
NL (1) NL8200133A (ja)
PH (1) PH19408A (ja)
SE (1) SE459708B (ja)
ZA (1) ZA8244B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6244461U (ja) * 1985-09-06 1987-03-17

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4591265A (en) * 1982-04-01 1986-05-27 Sullivan Donald F System for contact printing with liquid photopolymers
IT1234376B (it) * 1989-08-07 1992-05-15 3B Spa Attrezzatura per rivestire una superficie ed i bordi di un pannello di materiale ligneo o simile con un foglio di materiale termodeformabile.
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
US5449429A (en) * 1993-12-03 1995-09-12 Langenbrunner; James R. Apparatus for stretching and mounting films
AUPM527894A0 (en) * 1994-04-26 1994-05-19 Fawcett, Alan John Magnetic holding device
GB201000858D0 (en) * 2010-01-20 2010-03-10 Th Group Ltd Electronic circuit assembly

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54144497A (en) * 1978-05-01 1979-11-10 Minnesota Mining & Mfg Polymerizable oligomer * photopolymerizable composition and base material coated by said composition

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1099566A (en) * 1965-04-06 1968-01-17 Dunham Tool Company Inc Universal rotary chuck
DE1764456C3 (de) * 1968-06-08 1979-10-11 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zur Abbildung eines Musters auf eine Photolackschicht
US3579376A (en) * 1968-07-23 1971-05-18 United Aircraft Corp Method of forming a resist pattern on a circuit board or the like
FR2029328A5 (en) * 1969-01-24 1970-10-16 Grace W R Ltd Photographic print setting apparatus and - materials
GB1323415A (en) * 1969-07-04 1973-07-18 British United Shoe Machinery Workpiece holding devices
GB1289075A (ja) * 1970-04-30 1972-09-13
BE793732A (fr) * 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
US3907268A (en) * 1974-03-29 1975-09-23 Thomas F Hale Valve means for vacuum holding device
JPS51123140A (en) * 1975-04-19 1976-10-27 Nippon Paint Co Ltd Photosensitive compositions and processing method thereof
US4158141A (en) * 1978-06-21 1979-06-12 Hughes Aircraft Company Process for channeling ion beams
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54144497A (en) * 1978-05-01 1979-11-10 Minnesota Mining & Mfg Polymerizable oligomer * photopolymerizable composition and base material coated by said composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6244461U (ja) * 1985-09-06 1987-03-17

Also Published As

Publication number Publication date
GB2152861A (en) 1985-08-14
FR2498410A1 (fr) 1982-07-23
SE459708B (sv) 1989-07-24
GB2152861B (en) 1985-11-13
FR2498410B1 (fr) 1986-05-23
IT1196537B (it) 1988-11-16
GB8504266D0 (en) 1985-03-20
GB8419444D0 (en) 1984-09-05
AU557941B2 (en) 1987-01-15
ZA8244B (en) 1982-11-24
AU7926382A (en) 1982-07-22
IT8247576A0 (it) 1982-01-15
PH19408A (en) 1986-04-10
NL8200133A (nl) 1982-08-16
GB2091493A (en) 1982-07-28
CA1158091A (en) 1983-12-06
GB2151519A (en) 1985-07-24
DE3201577A1 (de) 1982-09-23
GB2151519B (en) 1985-12-24
GB2091493B (en) 1985-10-23
SE8200131L (sv) 1982-07-17

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