JPS57155785A - Semiconductor photo-receiving element photodetector - Google Patents
Semiconductor photo-receiving element photodetectorInfo
- Publication number
- JPS57155785A JPS57155785A JP56040497A JP4049781A JPS57155785A JP S57155785 A JPS57155785 A JP S57155785A JP 56040497 A JP56040497 A JP 56040497A JP 4049781 A JP4049781 A JP 4049781A JP S57155785 A JPS57155785 A JP S57155785A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- semiconductor photo
- receiving element
- pin junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000010410 layer Substances 0.000 abstract 4
- 238000011109 contamination Methods 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
Abstract
PURPOSE:To prevent external contamination and to eliminate problems of surface reflection, etc. by providing in the vicinity of the surface of a semiconductor photo-receiving a third protective layer which has a specific refractive index. CONSTITUTION:A Pin junction photodiode is composed of an N<-> silicon (refractive index n0=3.45) 22 on which a P<+> layer 27, N<+> layer 21 and N<+> channel stopper 28 are formed. On the surface of such a Pin junction photodiode, a Si3N4 film 24 (n1=2.24) and a PSG film 25 (n2=1.45) are deposited so as to satisfy: n1<2>=n0 n2, and, in addition, the third layer 26 of MgF2 (n3=1.38) is formed. By this, external contamination can be prevented as well as surface reflection can be reduced. Moreover, improvement in efficiency can be obtained when the refractive index n3 of the third layer is made to be n3<2>=n2 n4, where n4= refractive index of ambient atmosphere (vacuum or air).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56040497A JPS57155785A (en) | 1981-03-23 | 1981-03-23 | Semiconductor photo-receiving element photodetector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56040497A JPS57155785A (en) | 1981-03-23 | 1981-03-23 | Semiconductor photo-receiving element photodetector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57155785A true JPS57155785A (en) | 1982-09-25 |
Family
ID=12582197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56040497A Pending JPS57155785A (en) | 1981-03-23 | 1981-03-23 | Semiconductor photo-receiving element photodetector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57155785A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6021576A (en) * | 1983-07-15 | 1985-02-02 | Fuji Electric Corp Res & Dev Ltd | Photo detection element |
JPS6384169A (en) * | 1986-09-29 | 1988-04-14 | Matsushita Electronics Corp | Optical semiconductor device |
JPH0476964A (en) * | 1990-07-19 | 1992-03-11 | Toshiba Corp | Semiconductor photoelectric element |
EP0585055A1 (en) * | 1992-08-21 | 1994-03-02 | Santa Barbara Research Center | Wideband anti-reflection coating for indium antimonide photodetector device |
JPH08213647A (en) * | 1995-12-07 | 1996-08-20 | Matsushita Electron Corp | Optical semiconductor device |
JPH08228019A (en) * | 1995-12-07 | 1996-09-03 | Matsushita Electron Corp | Optical semiconductor device |
WO2003030270A1 (en) * | 2001-09-13 | 2003-04-10 | Sharp Kabushiki Kaisha | Split light-receiving device and optical disc drive comprising it |
-
1981
- 1981-03-23 JP JP56040497A patent/JPS57155785A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6021576A (en) * | 1983-07-15 | 1985-02-02 | Fuji Electric Corp Res & Dev Ltd | Photo detection element |
JPS6384169A (en) * | 1986-09-29 | 1988-04-14 | Matsushita Electronics Corp | Optical semiconductor device |
JPH0476964A (en) * | 1990-07-19 | 1992-03-11 | Toshiba Corp | Semiconductor photoelectric element |
EP0585055A1 (en) * | 1992-08-21 | 1994-03-02 | Santa Barbara Research Center | Wideband anti-reflection coating for indium antimonide photodetector device |
JPH08213647A (en) * | 1995-12-07 | 1996-08-20 | Matsushita Electron Corp | Optical semiconductor device |
JPH08228019A (en) * | 1995-12-07 | 1996-09-03 | Matsushita Electron Corp | Optical semiconductor device |
WO2003030270A1 (en) * | 2001-09-13 | 2003-04-10 | Sharp Kabushiki Kaisha | Split light-receiving device and optical disc drive comprising it |
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