JPS57149468A - Ion plating device - Google Patents
Ion plating deviceInfo
- Publication number
- JPS57149468A JPS57149468A JP3408881A JP3408881A JPS57149468A JP S57149468 A JPS57149468 A JP S57149468A JP 3408881 A JP3408881 A JP 3408881A JP 3408881 A JP3408881 A JP 3408881A JP S57149468 A JPS57149468 A JP S57149468A
- Authority
- JP
- Japan
- Prior art keywords
- target
- substrate
- evaporator
- molecular
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3408881A JPS57149468A (en) | 1981-03-09 | 1981-03-09 | Ion plating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3408881A JPS57149468A (en) | 1981-03-09 | 1981-03-09 | Ion plating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57149468A true JPS57149468A (en) | 1982-09-16 |
Family
ID=12404508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3408881A Pending JPS57149468A (en) | 1981-03-09 | 1981-03-09 | Ion plating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57149468A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995016798A1 (de) * | 1993-12-16 | 1995-06-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und einrichtung zum plasmaaktivierten bedampfen |
-
1981
- 1981-03-09 JP JP3408881A patent/JPS57149468A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995016798A1 (de) * | 1993-12-16 | 1995-06-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und einrichtung zum plasmaaktivierten bedampfen |
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