JPS57138186A - Infrared ray detector - Google Patents
Infrared ray detectorInfo
- Publication number
- JPS57138186A JPS57138186A JP56024448A JP2444881A JPS57138186A JP S57138186 A JPS57138186 A JP S57138186A JP 56024448 A JP56024448 A JP 56024448A JP 2444881 A JP2444881 A JP 2444881A JP S57138186 A JPS57138186 A JP S57138186A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- width
- forbidden band
- detecting element
- epitaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 abstract 2
- 229910004613 CdTe Inorganic materials 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1443—Devices controlled by radiation with at least one potential jump or surface barrier
Abstract
PURPOSE:To unite elements and miniaturize a detector, by forming an infrared detecting element on one of layers with multi-semiconductor piles different in forbidden band-width each other, providing an active circuit element on the other layer having a wider forbidden band-width than a layer where it is formed, and connecting them electrically. CONSTITUTION:A lower growth layer 21 of Hg0.7Cd0.3Te is grown in epitaxial on a large-area, single crystal thin-plate 20 of CdTe, where circuit elements like FETs are formed. Next, a small-area, upper layer 22 of Hg0.8Cd0.2Te is grown in epitaxial on it. An infrared detecting element is provided thereon. The surfaces of layers 21, 22 are covered with insulating films 23, 24 respectively. The forbidden band-width of the layer 21 for circuit element provision is chosen larger than that of the layer 22 for detecting element formation in this fashion. And yet, this provides unity on the same single crystal thin-plate 20. These connections are facilitated and their sizes are reduced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56024448A JPS57138186A (en) | 1981-02-20 | 1981-02-20 | Infrared ray detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56024448A JPS57138186A (en) | 1981-02-20 | 1981-02-20 | Infrared ray detector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57138186A true JPS57138186A (en) | 1982-08-26 |
Family
ID=12138429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56024448A Pending JPS57138186A (en) | 1981-02-20 | 1981-02-20 | Infrared ray detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57138186A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5293285A (en) * | 1976-02-02 | 1977-08-05 | Hitachi Ltd | Structure for semiconductor device |
JPS5553416A (en) * | 1978-10-11 | 1980-04-18 | Secr Defence Brit | Improvement of method of manufacturing semiconductor device |
JPS55102280A (en) * | 1979-01-30 | 1980-08-05 | Fujitsu Ltd | Infrared charge transfer device |
JPS5727054A (en) * | 1980-06-19 | 1982-02-13 | Rockwell International Corp | Selective access array circuit |
-
1981
- 1981-02-20 JP JP56024448A patent/JPS57138186A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5293285A (en) * | 1976-02-02 | 1977-08-05 | Hitachi Ltd | Structure for semiconductor device |
JPS5553416A (en) * | 1978-10-11 | 1980-04-18 | Secr Defence Brit | Improvement of method of manufacturing semiconductor device |
JPS55102280A (en) * | 1979-01-30 | 1980-08-05 | Fujitsu Ltd | Infrared charge transfer device |
JPS5727054A (en) * | 1980-06-19 | 1982-02-13 | Rockwell International Corp | Selective access array circuit |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1529139A (en) | Photovoltaic cell and a method of manufacturing such a cell | |
NO981507D0 (en) | Manufacture of thermoelectric modules, and solder for such manufacture | |
EP0330438A3 (en) | A method of fabricating superconducting electronic devices | |
EP0355951A3 (en) | Semiconductor device with memory cell region and a peripheral circuit and method of manufacturing the same | |
JPS57138186A (en) | Infrared ray detector | |
JPS57172778A (en) | Solar battery | |
GB2132017A (en) | Semiconductor device array | |
EP0343738A2 (en) | Manufacture of electronic devices comprising cadmium mercury telluride with silicon-on-sapphire circuitry | |
EP0155698A3 (en) | A method for manufacturing a semiconductor integrated circuit device provided with an improved isolation structure | |
CA2030713A1 (en) | Tunnel junction device composed of compound oxide superconductor material and method for fabricating the same | |
GB1516627A (en) | Method of producing a semiconductor photodiode of indium antimonide and device thereof | |
ROMSOS | Study of Pb (1-X) Sn (X) Te and Pb (1-Y) Sn (Y) Se photodetectors[M. S. Thesis] | |
JPS6271270A (en) | Infrared ray detector and manufacturing the same | |
US4379970A (en) | Pyroelectric detector arrays | |
EP0391420A3 (en) | Radiation resistant semiconductor structure | |
JPS56133882A (en) | Semiconductor optical detector | |
JPS6115592B2 (en) | ||
JPH10340856A (en) | Semiconductor crystal and hall element using the same | |
JPS635560A (en) | Array type infrared detector | |
JPS57160156A (en) | Semiconductor device | |
JPS58115853A (en) | Manufacture of image sensor | |
Ivanov et al. | Electrical properties of p-n junctions formed in lead telluride films. | |
JPS57115875A (en) | Semiconductor device and manufacture thereof | |
JPS60171766A (en) | Semiconductor device | |
JPH046876A (en) | Semiconductor device and manufacture thereof |