JPS57136647A - Mixed developer for developing negative photosensitive film containing diazonium salt polycondensate and developing method therefor - Google Patents

Mixed developer for developing negative photosensitive film containing diazonium salt polycondensate and developing method therefor

Info

Publication number
JPS57136647A
JPS57136647A JP57001093A JP109382A JPS57136647A JP S57136647 A JPS57136647 A JP S57136647A JP 57001093 A JP57001093 A JP 57001093A JP 109382 A JP109382 A JP 109382A JP S57136647 A JPS57136647 A JP S57136647A
Authority
JP
Japan
Prior art keywords
developing
percent
weight
diazonium salt
film containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57001093A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0141974B2 (en:Method
Inventor
Shiyupurinchiyuniku Geruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS57136647A publication Critical patent/JPS57136647A/ja
Publication of JPH0141974B2 publication Critical patent/JPH0141974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP57001093A 1981-01-08 1982-01-08 Mixed developer for developing negative photosensitive film containing diazonium salt polycondensate and developing method therefor Granted JPS57136647A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813100259 DE3100259A1 (de) 1981-01-08 1981-01-08 Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten

Publications (2)

Publication Number Publication Date
JPS57136647A true JPS57136647A (en) 1982-08-23
JPH0141974B2 JPH0141974B2 (en:Method) 1989-09-08

Family

ID=6122275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57001093A Granted JPS57136647A (en) 1981-01-08 1982-01-08 Mixed developer for developing negative photosensitive film containing diazonium salt polycondensate and developing method therefor

Country Status (10)

Country Link
US (1) US4395480A (en:Method)
EP (1) EP0056138B1 (en:Method)
JP (1) JPS57136647A (en:Method)
AT (1) ATE12322T1 (en:Method)
AU (1) AU546819B2 (en:Method)
BR (1) BR8200054A (en:Method)
CA (1) CA1165164A (en:Method)
DE (2) DE3100259A1 (en:Method)
FI (1) FI71024C (en:Method)
ZA (1) ZA819020B (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002031182A (ja) * 2000-06-14 2002-01-31 Weforma Gmbh ショックアブソーバ

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4786582A (en) * 1985-08-02 1988-11-22 Hoechst Celanese Corporation Organic solvent free developer for photosensitive coatings
GB8628613D0 (en) * 1986-11-29 1987-01-07 Horsell Graphic Ind Ltd Developing fluid for lithographic plates
US5081003A (en) * 1987-07-27 1992-01-14 Hoechst Celanese Corporation Developer compositions for newspaper plates
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
ATE180583T1 (de) * 1992-02-07 1999-06-15 Tadahiro Ohmi Lithographischer entwickler und lithographisches verfahren
ATE172551T1 (de) * 1992-02-10 1998-11-15 Tadahiro Ohmi Lithographisches verfahren
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
DE69315046T2 (de) * 1992-12-17 1998-06-04 Eastman Kodak Co Wässriger Entwickler für lithographische Druckplatten der zu einer verringerten Schlammbildung führt
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity
EP1621339B1 (en) * 2004-07-29 2008-09-10 FUJIFILM Corporation Plate-making method of lithographic printing plate
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
US20110236832A1 (en) * 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
WO2021145183A1 (ja) 2020-01-14 2021-07-22 株式会社小泉製作所 自転車用ベル
US20210364924A1 (en) * 2020-05-21 2021-11-25 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist developer and method of manufacturing a semiconductor device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1047016B (de) 1956-06-26 1958-12-18 Aufa G M B H Fabrikation Von O Verfahren zur Herstellung von Flachdruckformen
BE606642A (en:Method) * 1960-07-29
BE624160A (en:Method) * 1961-10-30
GB1220808A (en) * 1967-05-18 1971-01-27 Howson Algraphy Ltd Processing of presensitized photolithographic printing plate
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof
GB1383679A (en) * 1971-07-31 1974-02-12 Mita Industrial Co Ltd Process for development of two-component diazotype photosensitive materials
DE2353992C2 (de) * 1972-11-02 1982-12-02 Polychrome Corp., 10702 Yonkers, N.Y. Wäßriger Eintwickler für Flachdruckplatten und dessen Verwendung
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
DE2530502C2 (de) * 1974-07-22 1985-07-18 American Hoechst Corp., Bridgewater, N.J. Verfahren zum gleichzeitigen Entwickeln und Konservieren von Druckplatten sowie dafür geeignete Behandlungslösung
JPS5344202A (en) * 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
DE2809774A1 (de) 1978-03-07 1979-09-13 Hoechst Ag Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten
DE3162627D1 (en) * 1980-01-29 1984-07-12 Vickers Ltd Developers and methods of processing radiation sensitive plates using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002031182A (ja) * 2000-06-14 2002-01-31 Weforma Gmbh ショックアブソーバ

Also Published As

Publication number Publication date
FI71024C (fi) 1986-10-27
CA1165164A (en) 1984-04-10
AU7917882A (en) 1982-07-15
EP0056138A1 (de) 1982-07-21
FI820027L (fi) 1982-07-09
EP0056138B1 (de) 1985-03-20
DE3169477D1 (en) 1985-04-25
ATE12322T1 (de) 1985-04-15
JPH0141974B2 (en:Method) 1989-09-08
DE3100259A1 (de) 1982-08-05
AU546819B2 (en) 1985-09-19
ZA819020B (en) 1982-11-24
US4395480A (en) 1983-07-26
FI71024B (fi) 1986-07-18
BR8200054A (pt) 1982-10-26

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