JPS57132652A - Ionic source device - Google Patents

Ionic source device

Info

Publication number
JPS57132652A
JPS57132652A JP56017263A JP1726381A JPS57132652A JP S57132652 A JPS57132652 A JP S57132652A JP 56017263 A JP56017263 A JP 56017263A JP 1726381 A JP1726381 A JP 1726381A JP S57132652 A JPS57132652 A JP S57132652A
Authority
JP
Japan
Prior art keywords
chamber
arc chamber
slit
source device
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56017263A
Other languages
Japanese (ja)
Inventor
Koji Matsuda
Katsuo Naito
Masahiko Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NISSHIN HAIBORUTEEJI KK
Nissin High Voltage Co Ltd
Original Assignee
NISSHIN HAIBORUTEEJI KK
Nissin High Voltage Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NISSHIN HAIBORUTEEJI KK, Nissin High Voltage Co Ltd filed Critical NISSHIN HAIBORUTEEJI KK
Priority to JP56017263A priority Critical patent/JPS57132652A/en
Publication of JPS57132652A publication Critical patent/JPS57132652A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To enhance the production and enclosure of source plasmas, and improve the efficiency of an ionic source device by providing a multipolar magnetic-field generating coil over the wall of an arc chamber. CONSTITUTION:An arc chamber 7 is provided with a slit 14. A filament 8 is fixed near the slit 14, on the line connecting the slit 14 and the center of the arc chamber 7. Gas or the like supplied into the arc chamber 7 is converted into a plasma state by applying voltage across the chamber 7 and the filament 8. The outer wall of the chamber 7 is covered with an insulating cylinder 11. A multipolar magnetic-field generating coil 12 is wound around the entire outer surface of the cylinder 11.
JP56017263A 1981-02-06 1981-02-06 Ionic source device Pending JPS57132652A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56017263A JPS57132652A (en) 1981-02-06 1981-02-06 Ionic source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56017263A JPS57132652A (en) 1981-02-06 1981-02-06 Ionic source device

Publications (1)

Publication Number Publication Date
JPS57132652A true JPS57132652A (en) 1982-08-17

Family

ID=11939075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56017263A Pending JPS57132652A (en) 1981-02-06 1981-02-06 Ionic source device

Country Status (1)

Country Link
JP (1) JPS57132652A (en)

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