JPS57132373A - Manufacture of solar battery - Google Patents
Manufacture of solar batteryInfo
- Publication number
- JPS57132373A JPS57132373A JP56017419A JP1741981A JPS57132373A JP S57132373 A JPS57132373 A JP S57132373A JP 56017419 A JP56017419 A JP 56017419A JP 1741981 A JP1741981 A JP 1741981A JP S57132373 A JPS57132373 A JP S57132373A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- ion
- scanning
- current magnetic
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56017419A JPS57132373A (en) | 1981-02-10 | 1981-02-10 | Manufacture of solar battery |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56017419A JPS57132373A (en) | 1981-02-10 | 1981-02-10 | Manufacture of solar battery |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57132373A true JPS57132373A (en) | 1982-08-16 |
| JPS6155267B2 JPS6155267B2 (enrdf_load_stackoverflow) | 1986-11-27 |
Family
ID=11943483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56017419A Granted JPS57132373A (en) | 1981-02-10 | 1981-02-10 | Manufacture of solar battery |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57132373A (enrdf_load_stackoverflow) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011525301A (ja) * | 2008-06-11 | 2011-09-15 | インテバック・インコーポレイテッド | イオン注入装置及び半導体素子製造方法 |
| US8997688B2 (en) | 2009-06-23 | 2015-04-07 | Intevac, Inc. | Ion implant system having grid assembly |
| US9318332B2 (en) | 2012-12-19 | 2016-04-19 | Intevac, Inc. | Grid for plasma ion implant |
| US9324598B2 (en) | 2011-11-08 | 2016-04-26 | Intevac, Inc. | Substrate processing system and method |
| FR3067168A1 (fr) * | 2017-06-01 | 2018-12-07 | Segton Advanced Technology | Procede de fabrication d'un convertisseur lumiere-electricite tout en silicium pour une photoconversion geante |
| FR3067169A1 (fr) * | 2017-06-01 | 2018-12-07 | Segton Advanced Technology | Procede ameliore de fabrication d'un metamateriau a l'interieur d'un convertisseur lumiere-electricite en silinium |
| WO2018220447A3 (en) * | 2017-06-01 | 2019-02-14 | Segton Advanced Technologie Sas | IMPROVED METHOD OF MANUFACTURING CRYSTALLINE METAMATERIN WITHIN A SILICON LIGHT-ELECTRICITY CONVERTER |
| FR3081081A1 (fr) * | 2018-05-14 | 2019-11-15 | Segton Advanced Technology | Procede d'amorphisation pour creer industriellement un metamateriau a photoconversion geante dans un convertisseur lumiere-electricite tout en silicium |
-
1981
- 1981-02-10 JP JP56017419A patent/JPS57132373A/ja active Granted
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011525301A (ja) * | 2008-06-11 | 2011-09-15 | インテバック・インコーポレイテッド | イオン注入装置及び半導体素子製造方法 |
| US9741894B2 (en) | 2009-06-23 | 2017-08-22 | Intevac, Inc. | Ion implant system having grid assembly |
| US8997688B2 (en) | 2009-06-23 | 2015-04-07 | Intevac, Inc. | Ion implant system having grid assembly |
| US9303314B2 (en) | 2009-06-23 | 2016-04-05 | Intevac, Inc. | Ion implant system having grid assembly |
| US9324598B2 (en) | 2011-11-08 | 2016-04-26 | Intevac, Inc. | Substrate processing system and method |
| US9875922B2 (en) | 2011-11-08 | 2018-01-23 | Intevac, Inc. | Substrate processing system and method |
| US9318332B2 (en) | 2012-12-19 | 2016-04-19 | Intevac, Inc. | Grid for plasma ion implant |
| US9583661B2 (en) | 2012-12-19 | 2017-02-28 | Intevac, Inc. | Grid for plasma ion implant |
| FR3067168A1 (fr) * | 2017-06-01 | 2018-12-07 | Segton Advanced Technology | Procede de fabrication d'un convertisseur lumiere-electricite tout en silicium pour une photoconversion geante |
| FR3067169A1 (fr) * | 2017-06-01 | 2018-12-07 | Segton Advanced Technology | Procede ameliore de fabrication d'un metamateriau a l'interieur d'un convertisseur lumiere-electricite en silinium |
| WO2018220447A3 (en) * | 2017-06-01 | 2019-02-14 | Segton Advanced Technologie Sas | IMPROVED METHOD OF MANUFACTURING CRYSTALLINE METAMATERIN WITHIN A SILICON LIGHT-ELECTRICITY CONVERTER |
| WO2018220299A3 (fr) * | 2017-06-01 | 2019-03-28 | Segton Advanced Technologie Sas | Procédé de fabrication d'un convertisseur lumière-électricité tout en silicium pour une photoconvertion géante |
| US11437532B2 (en) | 2017-06-01 | 2022-09-06 | Segton Advanced Technology | Method for the production of a light-to-electricity converter made entirely from silicon for a giant photoconversion |
| FR3081081A1 (fr) * | 2018-05-14 | 2019-11-15 | Segton Advanced Technology | Procede d'amorphisation pour creer industriellement un metamateriau a photoconversion geante dans un convertisseur lumiere-electricite tout en silicium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6155267B2 (enrdf_load_stackoverflow) | 1986-11-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1253620A3 (en) | Ion beam scanning method and apparatus | |
| JPS57132373A (en) | Manufacture of solar battery | |
| JPS57182956A (en) | Ion-implantation device | |
| JPS53102677A (en) | Ion beam radiating unit | |
| CA2129403A1 (en) | Ion Implanting Apparatus and Ion Implanting Method | |
| IE810631L (en) | Semiconductor device with a v-groove insulating isolation¹structure | |
| JPS5249774A (en) | Ion implanting device | |
| JPS5680126A (en) | Formation of monocrystalline semiconductor | |
| DE3581449D1 (de) | Verfahren und vorrichtung zur demineralisierung von wasser. | |
| JPS5755591A (en) | Information recording method | |
| JPS52128053A (en) | Electron microscope | |
| JPS57130358A (en) | Full automatic ion implantation device | |
| JPS5632722A (en) | Ion implanting apparatus | |
| JPS6430224A (en) | Plasma processing method | |
| JPS54122970A (en) | Objective lens for scanning electronic microscope or the like | |
| JPS642786A (en) | Ion beam machine | |
| JPS5571489A (en) | Culture in liquid of tubercle bacilli | |
| GB1321172A (en) | Method and device for obtaining parallel and focused ionic microbeams and application of said method to the collective formation of electric circuits by ion implantation | |
| JPS5570021A (en) | Etching method of compound semiconductor | |
| Minnucci | Electron Beam and Laser Process Applications for Silicon Solar Cells | |
| JPS57111019A (en) | Doping method for impurity | |
| JPS54865A (en) | Molecular beam crystal growing method | |
| Otero et al. | Interactions of Gliding Dislocations With Dislocations Loops and Point Defects in Neutron and Electron-Irradiated Single Crystals of Niobium | |
| LORENZO et al. | Method for fabricating low loss crystalline silicon waveguides by dielectric implantation(Patent) | |
| JPS5619626A (en) | Manufacture of semiconductor device |