JPS57123978A - Alyminum etching method and gas mixture - Google Patents

Alyminum etching method and gas mixture

Info

Publication number
JPS57123978A
JPS57123978A JP56164875A JP16487581A JPS57123978A JP S57123978 A JPS57123978 A JP S57123978A JP 56164875 A JP56164875 A JP 56164875A JP 16487581 A JP16487581 A JP 16487581A JP S57123978 A JPS57123978 A JP S57123978A
Authority
JP
Japan
Prior art keywords
alyminum
gas mixture
etching method
etching
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56164875A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0245714B2 (OSRAM
Inventor
Efu Raikarudaafua Richiyaado
Shii Buougaru Daian
Shii Tangu Marian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BURANSON INTERN PURAZUMA CORP
Original Assignee
BURANSON INTERN PURAZUMA CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BURANSON INTERN PURAZUMA CORP filed Critical BURANSON INTERN PURAZUMA CORP
Publication of JPS57123978A publication Critical patent/JPS57123978A/ja
Publication of JPH0245714B2 publication Critical patent/JPH0245714B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/267—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP56164875A 1980-10-14 1981-10-14 Alyminum etching method and gas mixture Granted JPS57123978A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19661680A 1980-10-14 1980-10-14

Publications (2)

Publication Number Publication Date
JPS57123978A true JPS57123978A (en) 1982-08-02
JPH0245714B2 JPH0245714B2 (OSRAM) 1990-10-11

Family

ID=22726125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56164875A Granted JPS57123978A (en) 1980-10-14 1981-10-14 Alyminum etching method and gas mixture

Country Status (3)

Country Link
JP (1) JPS57123978A (OSRAM)
DE (1) DE3140675A1 (OSRAM)
GB (1) GB2087315B (OSRAM)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158630A (ja) * 1984-01-30 1985-08-20 Hitachi Ltd ドライエツチング方法
JPS61235576A (ja) * 1985-04-10 1986-10-20 Tokuda Seisakusho Ltd ドライエツチング装置
JPS62232926A (ja) * 1986-04-03 1987-10-13 Anelva Corp ドライエツチング方法
JPS6376437A (ja) * 1986-09-19 1988-04-06 Nec Corp ドライエツチング方法
JP2014136366A (ja) * 2013-01-17 2014-07-28 National Univ Corp Shizuoka Univ アルミ・樹脂接合体の製造方法及びアルミ・樹脂接合体

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4505782A (en) * 1983-03-25 1985-03-19 Lfe Corporation Plasma reactive ion etching of aluminum and aluminum alloys
GB2171360A (en) * 1985-02-19 1986-08-28 Oerlikon Buehrle Inc Etching aluminum/copper alloy films
DE3821207A1 (de) * 1988-06-23 1989-12-28 Leybold Ag Anordnung zum beschichten eines substrats mit dielektrika
DE3940820C2 (de) * 1989-12-11 1998-07-09 Leybold Ag Verfahren zur Behandlung von Werkstücken durch reaktives Ionenätzen
US5397433A (en) * 1993-08-20 1995-03-14 Vlsi Technology, Inc. Method and apparatus for patterning a metal layer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54158343A (en) * 1978-06-05 1979-12-14 Hitachi Ltd Dry etching method for al and al alloy
US4182646A (en) * 1978-07-27 1980-01-08 John Zajac Process of etching with plasma etch gas
US4256534A (en) * 1978-07-31 1981-03-17 Bell Telephone Laboratories, Incorporated Device fabrication by plasma etching
US4208241A (en) * 1978-07-31 1980-06-17 Bell Telephone Laboratories, Incorporated Device fabrication by plasma etching
FR2432560A1 (fr) * 1978-08-02 1980-02-29 Texas Instruments Inc Procede de decapage de metaux, en particulier d'aluminium, au plasma de tetrachlorure de silicium
US4209357A (en) * 1979-05-18 1980-06-24 Tegal Corporation Plasma reactor apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60158630A (ja) * 1984-01-30 1985-08-20 Hitachi Ltd ドライエツチング方法
JPS61235576A (ja) * 1985-04-10 1986-10-20 Tokuda Seisakusho Ltd ドライエツチング装置
JPS62232926A (ja) * 1986-04-03 1987-10-13 Anelva Corp ドライエツチング方法
JPS6376437A (ja) * 1986-09-19 1988-04-06 Nec Corp ドライエツチング方法
JP2014136366A (ja) * 2013-01-17 2014-07-28 National Univ Corp Shizuoka Univ アルミ・樹脂接合体の製造方法及びアルミ・樹脂接合体

Also Published As

Publication number Publication date
DE3140675A1 (de) 1982-06-16
GB2087315A (en) 1982-05-26
GB2087315B (en) 1984-07-18
DE3140675C2 (OSRAM) 1991-03-07
JPH0245714B2 (OSRAM) 1990-10-11

Similar Documents

Publication Publication Date Title
AU6980081A (en) Gas scrubbing apparatus and method
GB2037966B (en) Method of gas separation
JPS57111206A (en) Ozonizer and method
GB2082314B (en) Combustion method and apparatus
NZ198870A (en) Method and apparatus for manufacturing synthesis gas
JPS55139816A (en) Method of separating gas
PT73505B (en) Gas analyser
JPS57203455A (en) Gas mixing and preparing method
GB2155805B (en) Gas separation process and apparatus
GB2148127B (en) Gas humidifying apparatus and method
DE3376145D1 (en) Gas sensor and method of using same
DE3371870D1 (en) Gas scrubbing method and device
GB2154465B (en) Gas separation method and apparatus
JPS57123978A (en) Alyminum etching method and gas mixture
ZA818123B (en) Keyboard and method of making keyboard
GB2078755B (en) Oxytocin analogues and method for preparation thereof
DE3167680D1 (en) Gas wiping apparatus and method of using
DE3375001D1 (en) Contact keyboard and method of its manufacture
JPS57162632A (en) Method of separating gas
JPS57142254A (en) Gas pasturization method
JPS56126920A (en) Method of mutually reducing diffusion
GB2076023B (en) Gas carburising
JPS55165160A (en) Gas separator and its operating method
JPS56120796A (en) Gas manufacture
ZA812394B (en) Gas wiping apparatus and method of using