JPS57120931A - Positive type photosensitive resin composition - Google Patents

Positive type photosensitive resin composition

Info

Publication number
JPS57120931A
JPS57120931A JP670881A JP670881A JPS57120931A JP S57120931 A JPS57120931 A JP S57120931A JP 670881 A JP670881 A JP 670881A JP 670881 A JP670881 A JP 670881A JP S57120931 A JPS57120931 A JP S57120931A
Authority
JP
Japan
Prior art keywords
compound
copolymer
photosensitive resin
resin composition
positive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP670881A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0145613B2 (Direct
Inventor
Yukihiro Hosaka
Yoichi Kamoshita
Yoshiyuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
JSR Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd, Japan Synthetic Rubber Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP670881A priority Critical patent/JPS57120931A/ja
Publication of JPS57120931A publication Critical patent/JPS57120931A/ja
Publication of JPH0145613B2 publication Critical patent/JPH0145613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP670881A 1981-01-20 1981-01-20 Positive type photosensitive resin composition Granted JPS57120931A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP670881A JPS57120931A (en) 1981-01-20 1981-01-20 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP670881A JPS57120931A (en) 1981-01-20 1981-01-20 Positive type photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57120931A true JPS57120931A (en) 1982-07-28
JPH0145613B2 JPH0145613B2 (Direct) 1989-10-04

Family

ID=11645790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP670881A Granted JPS57120931A (en) 1981-01-20 1981-01-20 Positive type photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57120931A (Direct)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
EP0150315A3 (en) * 1984-01-30 1987-04-29 International Business Machines Corporation Tailoring of novolak/diazoquinone positive resists by acylation
EP0144880A3 (de) * 1983-12-07 1987-05-06 MERCK PATENT GmbH Positiv-Fotoresistzusammensetzungen
JP2006096925A (ja) * 2004-09-30 2006-04-13 Sumitomo Bakelite Co Ltd 樹脂組成物、樹脂層、樹脂層付きキャリア材料および回路基板
JP2009102659A (ja) * 2004-04-30 2009-05-14 Maruzen Petrochem Co Ltd 半導体リソグラフィー用共重合体とその製造方法、および組成物
JP2010202699A (ja) * 2009-02-27 2010-09-16 Maruzen Petrochem Co Ltd フォトレジスト用共重合体の製造方法
US9733564B2 (en) 2010-10-18 2017-08-15 Mitsubishi Chemical Corporation Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
JP2017529413A (ja) * 2014-07-14 2017-10-05 ワッカー ケミー アクチエンゲゼルシャフトＷａｃｋｅｒ Ｃｈｅｍｉｅ ＡＧ ワックス品質を有する脂肪酸ビニルエステルコポリマー

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
EP0144880A3 (de) * 1983-12-07 1987-05-06 MERCK PATENT GmbH Positiv-Fotoresistzusammensetzungen
EP0150315A3 (en) * 1984-01-30 1987-04-29 International Business Machines Corporation Tailoring of novolak/diazoquinone positive resists by acylation
JP2009102659A (ja) * 2004-04-30 2009-05-14 Maruzen Petrochem Co Ltd 半導体リソグラフィー用共重合体とその製造方法、および組成物
JP2006096925A (ja) * 2004-09-30 2006-04-13 Sumitomo Bakelite Co Ltd 樹脂組成物、樹脂層、樹脂層付きキャリア材料および回路基板
JP2010202699A (ja) * 2009-02-27 2010-09-16 Maruzen Petrochem Co Ltd フォトレジスト用共重合体の製造方法
US9733564B2 (en) 2010-10-18 2017-08-15 Mitsubishi Chemical Corporation Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
JP2017529413A (ja) * 2014-07-14 2017-10-05 ワッカー ケミー アクチエンゲゼルシャフトＷａｃｋｅｒ Ｃｈｅｍｉｅ ＡＧ ワックス品質を有する脂肪酸ビニルエステルコポリマー
US10111446B2 (en) 2014-07-14 2018-10-30 Wacker Chemie Ag Fatty acid vinyl ester copolymers with wax qualities

Also Published As

Publication number Publication date
JPH0145613B2 (Direct) 1989-10-04

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