JPS57120231A - Method and device for manufacture of magnetic recording medium - Google Patents

Method and device for manufacture of magnetic recording medium

Info

Publication number
JPS57120231A
JPS57120231A JP423281A JP423281A JPS57120231A JP S57120231 A JPS57120231 A JP S57120231A JP 423281 A JP423281 A JP 423281A JP 423281 A JP423281 A JP 423281A JP S57120231 A JPS57120231 A JP S57120231A
Authority
JP
Japan
Prior art keywords
magnetic
shaft
target
take
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP423281A
Other languages
Japanese (ja)
Other versions
JPS641855B2 (en
Inventor
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP423281A priority Critical patent/JPS57120231A/en
Publication of JPS57120231A publication Critical patent/JPS57120231A/en
Publication of JPS641855B2 publication Critical patent/JPS641855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To speed the formation of a ferromagnetic thin film by sputtering, by using a movable flexible target. CONSTITUTION:While a high polymer formed-body base 3 is conveyed from a feed shaft 4 to a take-up shaft 5 along a rotary drum 2 in a vaccum container 1, a flexible target 7 formed by providing a ferromagnetic layer on a flexible base material opposite to the drum 2 or by using a thin plate of the ferromagnetic layer is conveyed continuously or intermittently from a feed shaft 9 to a take-up shaft 10, and a magnetic-field generating mechanism 11 and an electrode 15 are arranged closely to the target to perform sputtering treatment in the presence of a magnetic field obtained by the magnetic-field generating mechanism, thus forming a magnetic layer on the base material 3.
JP423281A 1981-01-14 1981-01-14 Method and device for manufacture of magnetic recording medium Granted JPS57120231A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP423281A JPS57120231A (en) 1981-01-14 1981-01-14 Method and device for manufacture of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP423281A JPS57120231A (en) 1981-01-14 1981-01-14 Method and device for manufacture of magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS57120231A true JPS57120231A (en) 1982-07-27
JPS641855B2 JPS641855B2 (en) 1989-01-12

Family

ID=11578814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP423281A Granted JPS57120231A (en) 1981-01-14 1981-01-14 Method and device for manufacture of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS57120231A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2460456A (en) * 2008-05-30 2009-12-02 Mantis Deposition Ltd Sputtering apparatus
CN112626458A (en) * 2020-12-08 2021-04-09 深圳市华星光电半导体显示技术有限公司 Magnetron sputtering device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2460456A (en) * 2008-05-30 2009-12-02 Mantis Deposition Ltd Sputtering apparatus
CN112626458A (en) * 2020-12-08 2021-04-09 深圳市华星光电半导体显示技术有限公司 Magnetron sputtering device

Also Published As

Publication number Publication date
JPS641855B2 (en) 1989-01-12

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