JPS57118022A - Formation of zinc oxide film - Google Patents
Formation of zinc oxide filmInfo
- Publication number
- JPS57118022A JPS57118022A JP56003567A JP356781A JPS57118022A JP S57118022 A JPS57118022 A JP S57118022A JP 56003567 A JP56003567 A JP 56003567A JP 356781 A JP356781 A JP 356781A JP S57118022 A JPS57118022 A JP S57118022A
- Authority
- JP
- Japan
- Prior art keywords
- zinc oxide
- oxide film
- substrate
- layer
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 title abstract 20
- 239000011787 zinc oxide Substances 0.000 title abstract 10
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- 238000004544 sputter deposition Methods 0.000 abstract 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 3
- 239000011701 zinc Substances 0.000 abstract 3
- 229910052725 zinc Inorganic materials 0.000 abstract 3
- 239000000919 ceramic Substances 0.000 abstract 2
- 229910000942 Elinvar Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56003567A JPS57118022A (en) | 1981-01-12 | 1981-01-12 | Formation of zinc oxide film |
US06/337,081 US4410408A (en) | 1981-01-12 | 1982-01-05 | Method of preparing zinc oxide film |
DE19823200425 DE3200425A1 (de) | 1981-01-12 | 1982-01-09 | Verfahren zur herstellung eines zinkoxid-films |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56003567A JPS57118022A (en) | 1981-01-12 | 1981-01-12 | Formation of zinc oxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57118022A true JPS57118022A (en) | 1982-07-22 |
Family
ID=11561005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56003567A Pending JPS57118022A (en) | 1981-01-12 | 1981-01-12 | Formation of zinc oxide film |
Country Status (3)
Country | Link |
---|---|
US (1) | US4410408A (ja) |
JP (1) | JPS57118022A (ja) |
DE (1) | DE3200425A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62245546A (ja) * | 1986-04-17 | 1987-10-26 | Fuji Photo Film Co Ltd | 光磁気記録媒体の製造方法 |
CN102605322A (zh) * | 2011-01-24 | 2012-07-25 | 鸿富锦精密工业(深圳)有限公司 | 抗菌镀膜件及其制备方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5232571A (en) * | 1991-12-23 | 1993-08-03 | Iowa State University Research Foundation, Inc. | Aluminum nitride deposition using an AlN/Al sputter cycle technique |
DE19605932A1 (de) * | 1996-02-17 | 1997-08-21 | Leybold Systems Gmbh | Verfahren zum Ablagern einer optisch transparenten und elektrisch leitenden Schicht auf einem Substrat aus durchscheinendem Werkstoff |
US6153268A (en) * | 1999-07-29 | 2000-11-28 | Lucent Technologies Inc. | Method for producing oriented piezoelectric films |
KR102653836B1 (ko) * | 2015-03-03 | 2024-04-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치, 그 제작 방법, 또는 그를 포함하는 표시 장치 |
CN109207945B (zh) * | 2018-09-12 | 2022-05-20 | 杭州联芳科技有限公司 | 一种复合式磁控溅射沉积台 |
CN109207946B (zh) * | 2018-09-12 | 2022-05-20 | 杭州联芳科技有限公司 | 一种镍钛合金支架表面处理方法 |
CN111029475A (zh) * | 2019-11-25 | 2020-04-17 | 深圳市华星光电半导体显示技术有限公司 | 显示器及其制备方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5516554A (en) * | 1978-07-21 | 1980-02-05 | Toko Inc | Manufacture of thin film of zinc oxide |
-
1981
- 1981-01-12 JP JP56003567A patent/JPS57118022A/ja active Pending
-
1982
- 1982-01-05 US US06/337,081 patent/US4410408A/en not_active Expired - Lifetime
- 1982-01-09 DE DE19823200425 patent/DE3200425A1/de active Granted
Non-Patent Citations (1)
Title |
---|
JAPANESE JOURNAL OF APPLIED PHYSICS=1971 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62245546A (ja) * | 1986-04-17 | 1987-10-26 | Fuji Photo Film Co Ltd | 光磁気記録媒体の製造方法 |
CN102605322A (zh) * | 2011-01-24 | 2012-07-25 | 鸿富锦精密工业(深圳)有限公司 | 抗菌镀膜件及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
US4410408A (en) | 1983-10-18 |
DE3200425A1 (de) | 1983-03-03 |
DE3200425C2 (ja) | 1990-03-15 |
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