JPS57116771A - Formation of protecting film - Google Patents

Formation of protecting film

Info

Publication number
JPS57116771A
JPS57116771A JP480381A JP480381A JPS57116771A JP S57116771 A JPS57116771 A JP S57116771A JP 480381 A JP480381 A JP 480381A JP 480381 A JP480381 A JP 480381A JP S57116771 A JPS57116771 A JP S57116771A
Authority
JP
Japan
Prior art keywords
thin film
metallic thin
imide
film
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP480381A
Other languages
Japanese (ja)
Other versions
JPH021222B2 (en
Inventor
Takashi Suzuki
Kunio Hibino
Kiyotaka Wasa
Bunya Konishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP480381A priority Critical patent/JPS57116771A/en
Publication of JPS57116771A publication Critical patent/JPS57116771A/en
Publication of JPH021222B2 publication Critical patent/JPH021222B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

Abstract

PURPOSE:To improve the corrosion resistance and abrasion resistance of a ferromagnetic metallic thin film by evaporating a target consisting of a polymer contg. an imide bond in its main chain by impingement of inert gas ion and depositing the same on a substrate surface. CONSTITUTION:A heat resistant polymer such as polyimide, polyester imide or polyamide imide contg. the imide bond expressed by the formulaIin its main chain formed to a film shape or baked as a coating film on an Al plate is used as a target. The above-mentioned target is evaporated by ion impingement in an inert gas and is deposited on the surface of the substrate to be protected. Namely, the surface is sputtered. This method is particularly suited for forming a protecting film on a ferromagnetic metallic thin film directly or via a non- magnetic layer, and improves the corrosion resistance of the metallic thin film and the abrasion resistance against a magnetic head considerably.
JP480381A 1981-01-13 1981-01-13 Formation of protecting film Granted JPS57116771A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP480381A JPS57116771A (en) 1981-01-13 1981-01-13 Formation of protecting film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP480381A JPS57116771A (en) 1981-01-13 1981-01-13 Formation of protecting film

Publications (2)

Publication Number Publication Date
JPS57116771A true JPS57116771A (en) 1982-07-20
JPH021222B2 JPH021222B2 (en) 1990-01-10

Family

ID=11593918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP480381A Granted JPS57116771A (en) 1981-01-13 1981-01-13 Formation of protecting film

Country Status (1)

Country Link
JP (1) JPS57116771A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61242322A (en) * 1985-04-19 1986-10-28 Tokico Ltd Magnetic disk
EP0414560A2 (en) * 1989-08-25 1991-02-27 Kabushiki Kaisha Toshiba Method of manufacturing polyimide thin film and method of manufacturing liquid crystal orientation film of polyimide

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61242322A (en) * 1985-04-19 1986-10-28 Tokico Ltd Magnetic disk
EP0414560A2 (en) * 1989-08-25 1991-02-27 Kabushiki Kaisha Toshiba Method of manufacturing polyimide thin film and method of manufacturing liquid crystal orientation film of polyimide

Also Published As

Publication number Publication date
JPH021222B2 (en) 1990-01-10

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