JPS5711347A - Exposing method - Google Patents

Exposing method

Info

Publication number
JPS5711347A
JPS5711347A JP8616980A JP8616980A JPS5711347A JP S5711347 A JPS5711347 A JP S5711347A JP 8616980 A JP8616980 A JP 8616980A JP 8616980 A JP8616980 A JP 8616980A JP S5711347 A JPS5711347 A JP S5711347A
Authority
JP
Japan
Prior art keywords
mask
heater wire
wafer
temperature difference
silicon wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8616980A
Other languages
Japanese (ja)
Inventor
Motoki Okazaki
Kenji Miyashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8616980A priority Critical patent/JPS5711347A/en
Publication of JPS5711347A publication Critical patent/JPS5711347A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To easily prevent slippage between a glass mask and a silicon wafer due to their temperature difference, by arranging a heater wire for heating the glass mask to make its temperature similar to that of the silicon wafer. CONSTITUTION:A glass mask 1 is covered with a heater wire 2 uniformly. Since a silicon wafer is irradiated with ultraviolet rays, the heater wire 2 is arranged so as not to interfere with the element pattern of the mask 1, and a heater wire as thin as possible is used. If there is a temperature difference between the wafer and the mask 1 in exposing the wafer, the mask 1 is uniformly heated rapidly with the heater wire 2 to a temperature obtained by calculation to prevent slippage between the mask 1 and the wafer, thus the slippage due to temperature difference to be easily prevented.
JP8616980A 1980-06-25 1980-06-25 Exposing method Pending JPS5711347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8616980A JPS5711347A (en) 1980-06-25 1980-06-25 Exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8616980A JPS5711347A (en) 1980-06-25 1980-06-25 Exposing method

Publications (1)

Publication Number Publication Date
JPS5711347A true JPS5711347A (en) 1982-01-21

Family

ID=13879246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8616980A Pending JPS5711347A (en) 1980-06-25 1980-06-25 Exposing method

Country Status (1)

Country Link
JP (1) JPS5711347A (en)

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