JPS57111457A - Voltage measuring device using electron beam - Google Patents

Voltage measuring device using electron beam

Info

Publication number
JPS57111457A
JPS57111457A JP55187339A JP18733980A JPS57111457A JP S57111457 A JPS57111457 A JP S57111457A JP 55187339 A JP55187339 A JP 55187339A JP 18733980 A JP18733980 A JP 18733980A JP S57111457 A JPS57111457 A JP S57111457A
Authority
JP
Japan
Prior art keywords
output signal
voltage
signal
analyzer
coincidence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55187339A
Other languages
Japanese (ja)
Other versions
JPH0145585B2 (en
Inventor
Akio Ito
Yoshiaki Goto
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55187339A priority Critical patent/JPS57111457A/en
Publication of JPS57111457A publication Critical patent/JPS57111457A/en
Publication of JPH0145585B2 publication Critical patent/JPH0145585B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/305—Contactless testing using electron beams

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Tests Of Electronic Circuits (AREA)

Abstract

PURPOSE:To eliminate an error of measurement caused by various factors, by superposing a ripple signal on the retarding voltage of an energy analyzer to carry out both the gain control and the output signal control at a time and accordingly normalizing the analysis output signal. CONSTITUTION:An electron beam probe 2 and an energy analyzer 4 are provided, and the retarding voltage is controlled to obrain a coincidence between the analysis output signal and the level reference quantity V0. The retarding voltage at that moment is defined as the voltage at the measuring point on a sample 1. In this case, the following means are provided: an LPF13 that delivers the DC component V1 of the analysis output signal; a means 14 that controls the retarding voltage to obtain a coincidence between the filter output signal and the voltage V0; a BPF21 that delivers the ripple component of the analysis output signal in the form of a variation factor signal DELTAV1; and a means 25 that controls the gain of the analyzer 4 to obtain a coincidence between the signal DELTAV1 and the variation reference level DELTAV0. Thus both the gain control of the analyzer 4 and the output signal control are carried out at a time.
JP55187339A 1980-12-29 1980-12-29 Voltage measuring device using electron beam Granted JPS57111457A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55187339A JPS57111457A (en) 1980-12-29 1980-12-29 Voltage measuring device using electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55187339A JPS57111457A (en) 1980-12-29 1980-12-29 Voltage measuring device using electron beam

Publications (2)

Publication Number Publication Date
JPS57111457A true JPS57111457A (en) 1982-07-10
JPH0145585B2 JPH0145585B2 (en) 1989-10-04

Family

ID=16204263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55187339A Granted JPS57111457A (en) 1980-12-29 1980-12-29 Voltage measuring device using electron beam

Country Status (1)

Country Link
JP (1) JPS57111457A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348173A (en) * 1989-07-17 1991-03-01 Fujitsu Ltd Electron beam apparatus
EP0505280A2 (en) * 1991-03-19 1992-09-23 Fujitsu Limited A method of measuring a voltage with an electron beam apparatus
JPH09219171A (en) * 1997-01-20 1997-08-19 Hitachi Ltd Electron beam inspection device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4243124A4 (en) 2020-12-04 2024-05-01 Sanyo Color Works, Ltd. Method for producing conductive paste

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348173A (en) * 1989-07-17 1991-03-01 Fujitsu Ltd Electron beam apparatus
EP0505280A2 (en) * 1991-03-19 1992-09-23 Fujitsu Limited A method of measuring a voltage with an electron beam apparatus
US5300880A (en) * 1991-03-19 1994-04-05 Fujitsu Limited Method of measuring a voltage with an electron beam apparatus
JPH09219171A (en) * 1997-01-20 1997-08-19 Hitachi Ltd Electron beam inspection device

Also Published As

Publication number Publication date
JPH0145585B2 (en) 1989-10-04

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