JPS57101833A - Photosensitve composition - Google Patents
Photosensitve compositionInfo
- Publication number
- JPS57101833A JPS57101833A JP17861880A JP17861880A JPS57101833A JP S57101833 A JPS57101833 A JP S57101833A JP 17861880 A JP17861880 A JP 17861880A JP 17861880 A JP17861880 A JP 17861880A JP S57101833 A JPS57101833 A JP S57101833A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- superior
- alkyl
- resistance
- contg
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17861880A JPS57101833A (en) | 1980-12-17 | 1980-12-17 | Photosensitve composition |
EP81110287A EP0054258B1 (en) | 1980-12-17 | 1981-12-09 | Photosensitive compositions |
DE8181110287T DE3174017D1 (en) | 1980-12-17 | 1981-12-09 | Photosensitive compositions |
US06/566,778 US4477553A (en) | 1980-12-17 | 1983-12-29 | Photosensitive compositions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17861880A JPS57101833A (en) | 1980-12-17 | 1980-12-17 | Photosensitve composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57101833A true JPS57101833A (en) | 1982-06-24 |
JPS6320326B2 JPS6320326B2 (ja) | 1988-04-27 |
Family
ID=16051590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17861880A Granted JPS57101833A (en) | 1980-12-17 | 1980-12-17 | Photosensitve composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57101833A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62173458A (ja) * | 1986-01-27 | 1987-07-30 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
JPH02185556A (ja) * | 1989-01-11 | 1990-07-19 | Japan Synthetic Rubber Co Ltd | 集積回路製造用感放射線性樹脂組成物 |
WO2005103105A1 (ja) * | 2004-04-23 | 2005-11-03 | Kanazawa University Technology Licensing Organization Ltd. | 立体規則性芳香族系高分子 |
-
1980
- 1980-12-17 JP JP17861880A patent/JPS57101833A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62173458A (ja) * | 1986-01-27 | 1987-07-30 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
JPH02185556A (ja) * | 1989-01-11 | 1990-07-19 | Japan Synthetic Rubber Co Ltd | 集積回路製造用感放射線性樹脂組成物 |
WO2005103105A1 (ja) * | 2004-04-23 | 2005-11-03 | Kanazawa University Technology Licensing Organization Ltd. | 立体規則性芳香族系高分子 |
Also Published As
Publication number | Publication date |
---|---|
JPS6320326B2 (ja) | 1988-04-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS561045A (en) | Photosensitive composition | |
US3669658A (en) | Photosensitive printing plate | |
JPS561044A (en) | Photosensitive composition | |
DK1747884T3 (da) | Positiv lysfølsom litografisk trykplade | |
JPS6472155A (en) | Developing solution for positive type photoresist | |
AU567264B2 (en) | Aqueous developable photosensitive lithographic printing plate composition | |
ES401505A1 (es) | Perfeccionamientos introducidos en articulos adecuados comoplacas litograficas presensibilizadas. | |
US4457999A (en) | Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light | |
GB1494043A (en) | Photosensitive lithographic printing plate precursors | |
KR850005630A (ko) | 음성 포토레지스트 시스템(Negative photoresist system) | |
KR920016265A (ko) | 알칼리 현상가능한 감광성 수지 조성물 | |
JPS57101833A (en) | Photosensitve composition | |
DE60222600D1 (de) | Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte und Herstellungsverfahren einer lithographischen Druckplatte damit | |
GB1350521A (en) | Light-sensitive compositions for presensitized printing plates | |
EP0152114A3 (en) | Method for making a dry planographic printing plate | |
GB2046931B (en) | Method of developing positive-acting photosensitive lithographic printing plate precursor | |
EP0353666A3 (en) | Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition | |
DE3270990D1 (en) | Developing solution for positive-acting radiation-sensitive reproduction layers | |
JPS5612645A (en) | Developing method for positive type photosensitive lithographic plate | |
EP0272686A3 (en) | Method for manufacture of lithographic printing plate | |
JPS5657035A (en) | Positive type photosensitive composition | |
JPS57101834A (en) | Photosensitive composition | |
DE3261128D1 (en) | Photosensitive mixture on the basis of o-naphthoquinone diazides, and photosensitive copying material produced therefrom | |
EP0333156A3 (en) | Lithographic plate necessitating no dampening water | |
KR960016307B1 (ko) | 1,2-나프토퀴논디아지드-기본 감광성 혼합물 및 이 혼합물을 사용하여 제조한 복사물질 |