JPS57101833A - Photosensitve composition - Google Patents

Photosensitve composition

Info

Publication number
JPS57101833A
JPS57101833A JP17861880A JP17861880A JPS57101833A JP S57101833 A JPS57101833 A JP S57101833A JP 17861880 A JP17861880 A JP 17861880A JP 17861880 A JP17861880 A JP 17861880A JP S57101833 A JPS57101833 A JP S57101833A
Authority
JP
Japan
Prior art keywords
plate
superior
alkyl
resistance
contg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17861880A
Other languages
English (en)
Other versions
JPS6320326B2 (ja
Inventor
Takeshi Yamamoto
Sei Goto
Masabumi Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP17861880A priority Critical patent/JPS57101833A/ja
Priority to EP81110287A priority patent/EP0054258B1/en
Priority to DE8181110287T priority patent/DE3174017D1/de
Publication of JPS57101833A publication Critical patent/JPS57101833A/ja
Priority to US06/566,778 priority patent/US4477553A/en
Publication of JPS6320326B2 publication Critical patent/JPS6320326B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP17861880A 1980-12-17 1980-12-17 Photosensitve composition Granted JPS57101833A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP17861880A JPS57101833A (en) 1980-12-17 1980-12-17 Photosensitve composition
EP81110287A EP0054258B1 (en) 1980-12-17 1981-12-09 Photosensitive compositions
DE8181110287T DE3174017D1 (en) 1980-12-17 1981-12-09 Photosensitive compositions
US06/566,778 US4477553A (en) 1980-12-17 1983-12-29 Photosensitive compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17861880A JPS57101833A (en) 1980-12-17 1980-12-17 Photosensitve composition

Publications (2)

Publication Number Publication Date
JPS57101833A true JPS57101833A (en) 1982-06-24
JPS6320326B2 JPS6320326B2 (ja) 1988-04-27

Family

ID=16051590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17861880A Granted JPS57101833A (en) 1980-12-17 1980-12-17 Photosensitve composition

Country Status (1)

Country Link
JP (1) JPS57101833A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62173458A (ja) * 1986-01-27 1987-07-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH02185556A (ja) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd 集積回路製造用感放射線性樹脂組成物
WO2005103105A1 (ja) * 2004-04-23 2005-11-03 Kanazawa University Technology Licensing Organization Ltd. 立体規則性芳香族系高分子

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62173458A (ja) * 1986-01-27 1987-07-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH02185556A (ja) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd 集積回路製造用感放射線性樹脂組成物
WO2005103105A1 (ja) * 2004-04-23 2005-11-03 Kanazawa University Technology Licensing Organization Ltd. 立体規則性芳香族系高分子

Also Published As

Publication number Publication date
JPS6320326B2 (ja) 1988-04-27

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