JPS5688103A - Diffraction grating - Google Patents

Diffraction grating

Info

Publication number
JPS5688103A
JPS5688103A JP16513579A JP16513579A JPS5688103A JP S5688103 A JPS5688103 A JP S5688103A JP 16513579 A JP16513579 A JP 16513579A JP 16513579 A JP16513579 A JP 16513579A JP S5688103 A JPS5688103 A JP S5688103A
Authority
JP
Japan
Prior art keywords
diffraction grating
vapor deposition
grating
deposition
beforehand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16513579A
Other languages
Japanese (ja)
Inventor
Hiroki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16513579A priority Critical patent/JPS5688103A/en
Publication of JPS5688103A publication Critical patent/JPS5688103A/en
Pending legal-status Critical Current

Links

Landscapes

  • Spectrometry And Color Measurement (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE: To inexpensively produce a precision diffraction grating by changing the sectional shape of an original grating by depositing means such as vapor deposition having directivity to the diffraction grating having beforehand been formed to a prescribed shape.
CONSTITUTION: A evaporating source VPS of the same material as that of the base BA of the diffraction grating having beforehand been formed to a prescribed shape is placed in a position sufficiently apart from the base BA and vapor deposition is performed diagonally from the direction orthogonal to the grooves of the grating. A deposition layer PL2 is formed on said deposition layer PL1 while continuouly varying incident angles, and a reflection layer BS of Au or Al is formed thereon. It is equally well to use an ion beam sputtering method in place of vapor deposition and at the time of forming the deposition layer PL2, it is desirable to carry out vapor deposition while applying white light to the diffraction grating and supervising the same. Thereby, the precision diffraction grating is inexpensively manufactured.
COPYRIGHT: (C)1981,JPO&Japio
JP16513579A 1979-12-19 1979-12-19 Diffraction grating Pending JPS5688103A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16513579A JPS5688103A (en) 1979-12-19 1979-12-19 Diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16513579A JPS5688103A (en) 1979-12-19 1979-12-19 Diffraction grating

Publications (1)

Publication Number Publication Date
JPS5688103A true JPS5688103A (en) 1981-07-17

Family

ID=15806556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16513579A Pending JPS5688103A (en) 1979-12-19 1979-12-19 Diffraction grating

Country Status (1)

Country Link
JP (1) JPS5688103A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103376485A (en) * 2012-04-12 2013-10-30 福州高意光学有限公司 Method for producing grating by utilizing coating technique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103376485A (en) * 2012-04-12 2013-10-30 福州高意光学有限公司 Method for producing grating by utilizing coating technique

Similar Documents

Publication Publication Date Title
EP0739001A3 (en) Deposition of insulating thin film by plurality of ion beams
JPS5226844A (en) Microscope
JPS5688103A (en) Diffraction grating
EP0269112A3 (en) Method of forming a thin crystalline metal film
JPS5619030A (en) Production of liquid crystal display element
CA2016354A1 (en) Method of fabricating oxide superconducting film
JPS5565239A (en) Method of forming film of titanium oxide on plastic base plate
JPS6439371A (en) Thin film forming device
JPS5432985A (en) Flattening method for substrate surface with protrusion
JPS52127259A (en) Observing surface sharpe
JPS5657010A (en) Holographic grating
JPS57112705A (en) Manufacture of holographic grating
JPS5491835A (en) Method and device for heating reflector
JPS5211787A (en) Method of manufacturing schottky barrier solar battery
JPS54866A (en) Molecular beam crystal growing device
JPS544567A (en) Growing apparatus of ion beam crystal
SU899714A1 (en) Method for making diffraction gratings
JPS6424422A (en) Formation of fine pattern
JPS6447858A (en) Vapor deposition method with laser
JPS5329080A (en) Electron beam exposure system
JPS57106114A (en) Ion beam sputtering apparatus
JPS60186806A (en) Manufacture of blazed grating
JPS6114653B2 (en)
JPS55131730A (en) Concaved echelette grating and its process
JPS5667803A (en) Preparation for reflector