JPS5684856A - Electron beam focusing device - Google Patents

Electron beam focusing device

Info

Publication number
JPS5684856A
JPS5684856A JP16238879A JP16238879A JPS5684856A JP S5684856 A JPS5684856 A JP S5684856A JP 16238879 A JP16238879 A JP 16238879A JP 16238879 A JP16238879 A JP 16238879A JP S5684856 A JPS5684856 A JP S5684856A
Authority
JP
Japan
Prior art keywords
electron beam
board member
focusing device
film
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16238879A
Other languages
Japanese (ja)
Inventor
Eiji Watanabe
Masayoshi Kuge
Katsuzo Kishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP16238879A priority Critical patent/JPS5684856A/en
Publication of JPS5684856A publication Critical patent/JPS5684856A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the cumulative charge onto an electron besm focusing device, by forming many openings, concaves or convexes on a board member having a path for passing an electron beam. CONSTITUTION:Many openings 3, concaves or convexes are formed on a board member 1 having an opening 2 for passing an electron beam. Or the second board member 4 made of conductive material and constituting a focusing device is arranged at the lower section of the board member 1. When projecting an electron beam EB from an electron beam exposing device, for example, the surface at the side of the first board member 1 where the electron beam is irradiated is contaminated to form an insulative film 8. Electron beams, stray electrons or ions will come and adhere to the said insulative film 8, thus to cumulate the charge, and said superficial charge will flow through the film 8 into the wall face of an auxiliary opening 3 etc. where the film isn't formed and discharged almost entirely. With such arrangement, the cumulative charge onto the electron beam focusing device can be reduced.
JP16238879A 1979-12-14 1979-12-14 Electron beam focusing device Pending JPS5684856A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16238879A JPS5684856A (en) 1979-12-14 1979-12-14 Electron beam focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16238879A JPS5684856A (en) 1979-12-14 1979-12-14 Electron beam focusing device

Publications (1)

Publication Number Publication Date
JPS5684856A true JPS5684856A (en) 1981-07-10

Family

ID=15753626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16238879A Pending JPS5684856A (en) 1979-12-14 1979-12-14 Electron beam focusing device

Country Status (1)

Country Link
JP (1) JPS5684856A (en)

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