JPS5683845A - Production for orientated ultrafine-grained film disc - Google Patents

Production for orientated ultrafine-grained film disc

Info

Publication number
JPS5683845A
JPS5683845A JP16098179A JP16098179A JPS5683845A JP S5683845 A JPS5683845 A JP S5683845A JP 16098179 A JP16098179 A JP 16098179A JP 16098179 A JP16098179 A JP 16098179A JP S5683845 A JPS5683845 A JP S5683845A
Authority
JP
Japan
Prior art keywords
disc
slit
ultrafine
magnetic field
ultrafine grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16098179A
Other languages
Japanese (ja)
Inventor
Atsushi Abe
Kuni Ogawa
Masahiro Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16098179A priority Critical patent/JPS5683845A/en
Publication of JPS5683845A publication Critical patent/JPS5683845A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)

Abstract

PURPOSE:To form the film of a uniform thickness easily, by rotating the disc while forming ultrafine grains in the evacuated gaseous atmosphere and by sticking ultrafine grains, which hassed throught the slit to which the magnetic field is applied, to the disc. CONSTITUTION:Under the evacuated gaseous atmosphere dependent upon inert gas, disc 1 is rotated while heating board 2 to form magnetic substance ultrafine grains. Therefore, ultrafine grains rise as shwon by the dotted lines and pass through slit 5 and are stuck onto disc surface 1A. Magnetic substance ultrafine- grained film 7 of a uniform thickness is formed due to rotation of disc 1. In this case, since the magnetic field is applied to all regions of slit 5 and the direction of the magnetic field is caused to be parallel with the rotation direction of disc 1 in the slit paet, ultrafine grains are orientated in the magnetic field direction during passage through slit 5 and are stuck onto disc surface 1A.
JP16098179A 1979-12-11 1979-12-11 Production for orientated ultrafine-grained film disc Pending JPS5683845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16098179A JPS5683845A (en) 1979-12-11 1979-12-11 Production for orientated ultrafine-grained film disc

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16098179A JPS5683845A (en) 1979-12-11 1979-12-11 Production for orientated ultrafine-grained film disc

Publications (1)

Publication Number Publication Date
JPS5683845A true JPS5683845A (en) 1981-07-08

Family

ID=15726295

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16098179A Pending JPS5683845A (en) 1979-12-11 1979-12-11 Production for orientated ultrafine-grained film disc

Country Status (1)

Country Link
JP (1) JPS5683845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6296318A (en) * 1985-10-19 1987-05-02 Res Dev Corp Of Japan Formation of isolated ultrafine metal oxide particle

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6296318A (en) * 1985-10-19 1987-05-02 Res Dev Corp Of Japan Formation of isolated ultrafine metal oxide particle
JPH0313173B2 (en) * 1985-10-19 1991-02-21 Shingijutsu Jigyodan

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