JPS5677975A - Production of magnetic bubble element - Google Patents
Production of magnetic bubble elementInfo
- Publication number
- JPS5677975A JPS5677975A JP15382679A JP15382679A JPS5677975A JP S5677975 A JPS5677975 A JP S5677975A JP 15382679 A JP15382679 A JP 15382679A JP 15382679 A JP15382679 A JP 15382679A JP S5677975 A JPS5677975 A JP S5677975A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- layer
- approximate
- density distribution
- maximum density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To make the maximum density distribution of the ion injection layer approximate to the crystal surface, by forming a concatenated disk pattern on a magnetic bubble crystal substrate and then injecting the ion to the crystal substrate excepting the pattern via an insulated spacer.
CONSTITUTION: When the ion injecting 10 is given to the epitaxial (LPE) layer 2 obtained by the liquid-phase growth, the insulated spacer 4 is coated on the surface of the layer 2 before the ion injection in order to make the maximum density distribution of ion approximate to the crystal surface. As a result, the ion flying distance is reduced after going into the layer 2, and accordingly the ion injection layer 3 the maximum density distribution of which is made to approximate to the crystal surface can be obtained. As the spacer 4, there may be used suitably the SiO2, ZnS and the like, and the energy of the ion of H+, Ne+ or the like is consumed at this layer.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15382679A JPS5677975A (en) | 1979-11-28 | 1979-11-28 | Production of magnetic bubble element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15382679A JPS5677975A (en) | 1979-11-28 | 1979-11-28 | Production of magnetic bubble element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5677975A true JPS5677975A (en) | 1981-06-26 |
Family
ID=15570927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15382679A Pending JPS5677975A (en) | 1979-11-28 | 1979-11-28 | Production of magnetic bubble element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5677975A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996594A (en) * | 1982-11-25 | 1984-06-04 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of ion implantation type magnetic bubble device |
-
1979
- 1979-11-28 JP JP15382679A patent/JPS5677975A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996594A (en) * | 1982-11-25 | 1984-06-04 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of ion implantation type magnetic bubble device |
JPS6153795B2 (en) * | 1982-11-25 | 1986-11-19 | Nippon Telegraph & Telephone |
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