JPS5677380A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS5677380A
JPS5677380A JP15293479A JP15293479A JPS5677380A JP S5677380 A JPS5677380 A JP S5677380A JP 15293479 A JP15293479 A JP 15293479A JP 15293479 A JP15293479 A JP 15293479A JP S5677380 A JPS5677380 A JP S5677380A
Authority
JP
Japan
Prior art keywords
shield ring
cathode
sputtering
shield
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15293479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6347785B2 (enrdf_load_stackoverflow
Inventor
Kensuke Nakada
Takehisa Nitta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15293479A priority Critical patent/JPS5677380A/ja
Publication of JPS5677380A publication Critical patent/JPS5677380A/ja
Publication of JPS6347785B2 publication Critical patent/JPS6347785B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15293479A 1979-11-28 1979-11-28 Sputtering apparatus Granted JPS5677380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15293479A JPS5677380A (en) 1979-11-28 1979-11-28 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15293479A JPS5677380A (en) 1979-11-28 1979-11-28 Sputtering apparatus

Publications (2)

Publication Number Publication Date
JPS5677380A true JPS5677380A (en) 1981-06-25
JPS6347785B2 JPS6347785B2 (enrdf_load_stackoverflow) 1988-09-26

Family

ID=15551331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15293479A Granted JPS5677380A (en) 1979-11-28 1979-11-28 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5677380A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110873A (ja) * 1983-11-17 1985-06-17 Fujitsu Ltd タ−ゲットの冷却方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112075U (enrdf_load_stackoverflow) * 1990-02-28 1991-11-15

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110873A (ja) * 1983-11-17 1985-06-17 Fujitsu Ltd タ−ゲットの冷却方法

Also Published As

Publication number Publication date
JPS6347785B2 (enrdf_load_stackoverflow) 1988-09-26

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