JPS5670869A - Spinner coating apparatus - Google Patents
Spinner coating apparatusInfo
- Publication number
- JPS5670869A JPS5670869A JP14656579A JP14656579A JPS5670869A JP S5670869 A JPS5670869 A JP S5670869A JP 14656579 A JP14656579 A JP 14656579A JP 14656579 A JP14656579 A JP 14656579A JP S5670869 A JPS5670869 A JP S5670869A
- Authority
- JP
- Japan
- Prior art keywords
- temp
- adsorption head
- signal
- resistance wire
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14656579A JPS5670869A (en) | 1979-11-14 | 1979-11-14 | Spinner coating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14656579A JPS5670869A (en) | 1979-11-14 | 1979-11-14 | Spinner coating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5670869A true JPS5670869A (en) | 1981-06-13 |
JPS6222661B2 JPS6222661B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-05-19 |
Family
ID=15410543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14656579A Granted JPS5670869A (en) | 1979-11-14 | 1979-11-14 | Spinner coating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5670869A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63111979U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1987-01-14 | 1988-07-19 | ||
JPH0286826A (ja) * | 1989-07-07 | 1990-03-27 | Hitachi Ltd | 被加工物の処理方法 |
JPH04363169A (ja) * | 1991-05-08 | 1992-12-16 | Hitachi Ltd | フォトレジストの塗布方法 |
JPH0824621A (ja) * | 1995-07-17 | 1996-01-30 | Hitachi Ltd | 処理液の滴下方法 |
-
1979
- 1979-11-14 JP JP14656579A patent/JPS5670869A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63111979U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1987-01-14 | 1988-07-19 | ||
JPH0286826A (ja) * | 1989-07-07 | 1990-03-27 | Hitachi Ltd | 被加工物の処理方法 |
JPH04363169A (ja) * | 1991-05-08 | 1992-12-16 | Hitachi Ltd | フォトレジストの塗布方法 |
JPH0824621A (ja) * | 1995-07-17 | 1996-01-30 | Hitachi Ltd | 処理液の滴下方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6222661B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-05-19 |
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