JPS5670548A - Development solution for washing out photosensitive copy layer and method of developing exposed photosensitive copy layer - Google Patents

Development solution for washing out photosensitive copy layer and method of developing exposed photosensitive copy layer

Info

Publication number
JPS5670548A
JPS5670548A JP14455880A JP14455880A JPS5670548A JP S5670548 A JPS5670548 A JP S5670548A JP 14455880 A JP14455880 A JP 14455880A JP 14455880 A JP14455880 A JP 14455880A JP S5670548 A JPS5670548 A JP S5670548A
Authority
JP
Japan
Prior art keywords
water
group
copolymer
soluble
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14455880A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320328B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Shiyupurintoshiyuni Geruharuto
Noibauaa Ruudorufu
Buuru Geruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5670548A publication Critical patent/JPS5670548A/ja
Publication of JPS6320328B2 publication Critical patent/JPS6320328B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP14455880A 1979-10-17 1980-10-17 Development solution for washing out photosensitive copy layer and method of developing exposed photosensitive copy layer Granted JPS5670548A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792941960 DE2941960A1 (de) 1979-10-17 1979-10-17 Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten

Publications (2)

Publication Number Publication Date
JPS5670548A true JPS5670548A (en) 1981-06-12
JPS6320328B2 JPS6320328B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-04-27

Family

ID=6083667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14455880A Granted JPS5670548A (en) 1979-10-17 1980-10-17 Development solution for washing out photosensitive copy layer and method of developing exposed photosensitive copy layer

Country Status (8)

Country Link
US (1) US4339530A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0027932B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5670548A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AT (1) ATE3473T1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU535273B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR8006657A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1156085A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (2) DE2941960A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8405549D0 (en) * 1984-03-02 1984-04-04 Sericol Group Ltd Screen printing compositions
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates
DE3600116A1 (de) * 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JPH01159644A (ja) * 1987-12-16 1989-06-22 Fuji Photo Film Co Ltd 水なしps版用現像液
US4912021A (en) * 1988-02-03 1990-03-27 Hoechst Celanese Corporation Developer-finisher compositions for lithographic plates
US4873174A (en) * 1988-02-03 1989-10-10 Hoechst Celanese Corporation Method of using developer-finisher compositions for lithographic plates
DE3836404A1 (de) * 1988-10-26 1990-05-03 Hoechst Ag Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen
US4985337A (en) * 1988-11-15 1991-01-15 Konica Corporation Image forming method and element, in which the element contains a release layer and a photosensitive o-quinone diaziode layer
US5035982A (en) * 1989-07-14 1991-07-30 Eastman Kodak Company Aqueous developer composition for developing negative working lithographic printing plate
JP2748057B2 (ja) * 1991-07-22 1998-05-06 富士写真フイルム株式会社 画像形成方法及びアルカリ性現像液
US6248503B1 (en) * 1997-11-07 2001-06-19 Agfa-Gevaert Method for making positive working printing plates from a heat mode sensitive imaging element
US9753369B2 (en) 2011-03-24 2017-09-05 Nissan Chemical Idustries, Ltd. Polymer-containing developer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1082016A (en) 1963-08-15 1967-09-06 Monsanto Co Polymers of n-vinyl-n-methylacetamide
DE1251532B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1963-09-25
JPS4988603A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-12-29 1974-08-24
GB1523877A (en) 1974-09-19 1978-09-06 Vickers Ltd Processing fo printing plates
JPS5344202A (en) * 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
DE2809774A1 (de) * 1978-03-07 1979-09-13 Hoechst Ag Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten

Also Published As

Publication number Publication date
BR8006657A (pt) 1981-04-22
EP0027932B1 (de) 1983-05-18
CA1156085A (en) 1983-11-01
DE2941960A1 (de) 1981-04-30
DE3063358D1 (en) 1983-07-07
AU6270680A (en) 1981-04-30
JPS6320328B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-04-27
EP0027932A1 (de) 1981-05-06
US4339530A (en) 1982-07-13
ATE3473T1 (de) 1983-06-15
AU535273B2 (en) 1984-03-08

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