JPS5669624A - Photoresist composition - Google Patents
Photoresist compositionInfo
- Publication number
- JPS5669624A JPS5669624A JP14505179A JP14505179A JPS5669624A JP S5669624 A JPS5669624 A JP S5669624A JP 14505179 A JP14505179 A JP 14505179A JP 14505179 A JP14505179 A JP 14505179A JP S5669624 A JPS5669624 A JP S5669624A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- photoresist composition
- added
- conjugated diene
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 abstract 2
- HWEONUWVYWIJPF-OWOJBTEDSA-N 1-azido-4-[(e)-2-(4-azidophenyl)ethenyl]benzene Chemical compound C1=CC(N=[N+]=[N-])=CC=C1\C=C\C1=CC=C(N=[N+]=[N-])C=C1 HWEONUWVYWIJPF-OWOJBTEDSA-N 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001540 azides Chemical class 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- -1 diamide compound Chemical class 0.000 abstract 1
- 150000001993 dienes Chemical class 0.000 abstract 1
- ALIFPGGMJDWMJH-UHFFFAOYSA-N n-phenyldiazenylaniline Chemical compound C=1C=CC=CC=1NN=NC1=CC=CC=C1 ALIFPGGMJDWMJH-UHFFFAOYSA-N 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14505179A JPS5669624A (en) | 1979-11-09 | 1979-11-09 | Photoresist composition |
| US06/185,771 US4349619A (en) | 1979-09-19 | 1980-09-10 | Photoresist composition |
| EP80303280A EP0026088B1 (en) | 1979-09-19 | 1980-09-18 | Photoresist compositions |
| DE8080303280T DE3065699D1 (en) | 1979-09-19 | 1980-09-18 | Photoresist compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14505179A JPS5669624A (en) | 1979-11-09 | 1979-11-09 | Photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5669624A true JPS5669624A (en) | 1981-06-11 |
| JPS622304B2 JPS622304B2 (enrdf_load_stackoverflow) | 1987-01-19 |
Family
ID=15376238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14505179A Granted JPS5669624A (en) | 1979-09-19 | 1979-11-09 | Photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5669624A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60208749A (ja) * | 1984-04-02 | 1985-10-21 | Japan Synthetic Rubber Co Ltd | ホトレジスト組成物 |
-
1979
- 1979-11-09 JP JP14505179A patent/JPS5669624A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60208749A (ja) * | 1984-04-02 | 1985-10-21 | Japan Synthetic Rubber Co Ltd | ホトレジスト組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS622304B2 (enrdf_load_stackoverflow) | 1987-01-19 |
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