JPS5662683A - Electron beam processing device - Google Patents

Electron beam processing device

Info

Publication number
JPS5662683A
JPS5662683A JP14006379A JP14006379A JPS5662683A JP S5662683 A JPS5662683 A JP S5662683A JP 14006379 A JP14006379 A JP 14006379A JP 14006379 A JP14006379 A JP 14006379A JP S5662683 A JPS5662683 A JP S5662683A
Authority
JP
Japan
Prior art keywords
electron beam
pipe
scattering materials
guide pipe
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14006379A
Other languages
Japanese (ja)
Inventor
Asaki Takemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daihen Corp
Original Assignee
Daihen Corp
Osaka Transformer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daihen Corp, Osaka Transformer Co Ltd filed Critical Daihen Corp
Priority to JP14006379A priority Critical patent/JPS5662683A/en
Publication of JPS5662683A publication Critical patent/JPS5662683A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To eliminate completely scattering materials flowing into the electron beam generator to make a long-time continuous processing possible without causing the discharge phenomenon, by connecting the vacuum exhaust pipe near the electron beam deflection point of the guide pipe.
CONSTITUTION: Material 5 to be processed is positioned in vacuum room 1, and vacuum room 1 and electron beam generator 6 are kept in a prescribed vacuum state. Electron beam 10 is covered with guide pipe 11 and is deflected by deflecting mechanisms 8 and 9 and is irradiated to the processing position. Scattering materials such as metal vapour and metal particles generated at the processing time go almost straightly through guide pipe 11 and go straightly in vacuum exhaust pipe 12 opening near deflecting mechanism 9. Air in pipe 12 is exhausted, and therefore, almost all scattering materials are transferred to the vacuum exhaust device through pipe 12. Consequently, scattering materials which reach electron beam generator 6 through the bending part of guide pipe 11 are eliminated completely, and the periodical elimination work of scattering materials is unnecessary.
COPYRIGHT: (C)1981,JPO&Japio
JP14006379A 1979-10-29 1979-10-29 Electron beam processing device Pending JPS5662683A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14006379A JPS5662683A (en) 1979-10-29 1979-10-29 Electron beam processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14006379A JPS5662683A (en) 1979-10-29 1979-10-29 Electron beam processing device

Publications (1)

Publication Number Publication Date
JPS5662683A true JPS5662683A (en) 1981-05-28

Family

ID=15260110

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14006379A Pending JPS5662683A (en) 1979-10-29 1979-10-29 Electron beam processing device

Country Status (1)

Country Link
JP (1) JPS5662683A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007200696A (en) * 2006-01-26 2007-08-09 Molex Inc Cover for connector and connector using above cover
GB2519511A (en) * 2013-09-27 2015-04-29 Zeiss Carl Microscopy Gmbh Particle optical system having a liner tube and/or compensating coils

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007200696A (en) * 2006-01-26 2007-08-09 Molex Inc Cover for connector and connector using above cover
GB2519511A (en) * 2013-09-27 2015-04-29 Zeiss Carl Microscopy Gmbh Particle optical system having a liner tube and/or compensating coils

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