JPS5662683A - Electron beam processing device - Google Patents
Electron beam processing deviceInfo
- Publication number
- JPS5662683A JPS5662683A JP14006379A JP14006379A JPS5662683A JP S5662683 A JPS5662683 A JP S5662683A JP 14006379 A JP14006379 A JP 14006379A JP 14006379 A JP14006379 A JP 14006379A JP S5662683 A JPS5662683 A JP S5662683A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- pipe
- scattering materials
- guide pipe
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To eliminate completely scattering materials flowing into the electron beam generator to make a long-time continuous processing possible without causing the discharge phenomenon, by connecting the vacuum exhaust pipe near the electron beam deflection point of the guide pipe.
CONSTITUTION: Material 5 to be processed is positioned in vacuum room 1, and vacuum room 1 and electron beam generator 6 are kept in a prescribed vacuum state. Electron beam 10 is covered with guide pipe 11 and is deflected by deflecting mechanisms 8 and 9 and is irradiated to the processing position. Scattering materials such as metal vapour and metal particles generated at the processing time go almost straightly through guide pipe 11 and go straightly in vacuum exhaust pipe 12 opening near deflecting mechanism 9. Air in pipe 12 is exhausted, and therefore, almost all scattering materials are transferred to the vacuum exhaust device through pipe 12. Consequently, scattering materials which reach electron beam generator 6 through the bending part of guide pipe 11 are eliminated completely, and the periodical elimination work of scattering materials is unnecessary.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14006379A JPS5662683A (en) | 1979-10-29 | 1979-10-29 | Electron beam processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14006379A JPS5662683A (en) | 1979-10-29 | 1979-10-29 | Electron beam processing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5662683A true JPS5662683A (en) | 1981-05-28 |
Family
ID=15260110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14006379A Pending JPS5662683A (en) | 1979-10-29 | 1979-10-29 | Electron beam processing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5662683A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007200696A (en) * | 2006-01-26 | 2007-08-09 | Molex Inc | Cover for connector and connector using above cover |
GB2519511A (en) * | 2013-09-27 | 2015-04-29 | Zeiss Carl Microscopy Gmbh | Particle optical system having a liner tube and/or compensating coils |
-
1979
- 1979-10-29 JP JP14006379A patent/JPS5662683A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007200696A (en) * | 2006-01-26 | 2007-08-09 | Molex Inc | Cover for connector and connector using above cover |
GB2519511A (en) * | 2013-09-27 | 2015-04-29 | Zeiss Carl Microscopy Gmbh | Particle optical system having a liner tube and/or compensating coils |
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