JPS5657035A - Positive type photosensitive composition - Google Patents
Positive type photosensitive compositionInfo
- Publication number
- JPS5657035A JPS5657035A JP13262079A JP13262079A JPS5657035A JP S5657035 A JPS5657035 A JP S5657035A JP 13262079 A JP13262079 A JP 13262079A JP 13262079 A JP13262079 A JP 13262079A JP S5657035 A JPS5657035 A JP S5657035A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- plate
- photosensitive composition
- sulfophthalein
- org
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 239000007793 ph indicator Substances 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13262079A JPS5657035A (en) | 1979-10-15 | 1979-10-15 | Positive type photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13262079A JPS5657035A (en) | 1979-10-15 | 1979-10-15 | Positive type photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5657035A true JPS5657035A (en) | 1981-05-19 |
| JPS6245972B2 JPS6245972B2 (en, 2012) | 1987-09-30 |
Family
ID=15085577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13262079A Granted JPS5657035A (en) | 1979-10-15 | 1979-10-15 | Positive type photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5657035A (en, 2012) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2508188A1 (fr) * | 1981-06-19 | 1982-12-24 | Sericol Group Ltd | Compositions photosensibles et leur utilisation |
| US4808513A (en) * | 1987-04-06 | 1989-02-28 | Morton Thiokol, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
| US5094934A (en) * | 1987-04-06 | 1992-03-10 | Morton International, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
| US5126230A (en) * | 1987-04-06 | 1992-06-30 | Morton International, Inc. | High contrast, positive photoresist developer containing alkanolamine |
| US5248582A (en) * | 1988-09-07 | 1993-09-28 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62202167U (en, 2012) * | 1986-06-12 | 1987-12-23 |
-
1979
- 1979-10-15 JP JP13262079A patent/JPS5657035A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2508188A1 (fr) * | 1981-06-19 | 1982-12-24 | Sericol Group Ltd | Compositions photosensibles et leur utilisation |
| US4808513A (en) * | 1987-04-06 | 1989-02-28 | Morton Thiokol, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
| US5094934A (en) * | 1987-04-06 | 1992-03-10 | Morton International, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
| US5126230A (en) * | 1987-04-06 | 1992-06-30 | Morton International, Inc. | High contrast, positive photoresist developer containing alkanolamine |
| US5248582A (en) * | 1988-09-07 | 1993-09-28 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6245972B2 (en, 2012) | 1987-09-30 |
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