JPS5711337A - Photosensitive material for lithographic original plate - Google Patents

Photosensitive material for lithographic original plate

Info

Publication number
JPS5711337A
JPS5711337A JP8477980A JP8477980A JPS5711337A JP S5711337 A JPS5711337 A JP S5711337A JP 8477980 A JP8477980 A JP 8477980A JP 8477980 A JP8477980 A JP 8477980A JP S5711337 A JPS5711337 A JP S5711337A
Authority
JP
Japan
Prior art keywords
exposed part
plate
condensate
coating material
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8477980A
Other languages
Japanese (ja)
Inventor
Masayuki Suwa
Giichi Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP8477980A priority Critical patent/JPS5711337A/en
Publication of JPS5711337A publication Critical patent/JPS5711337A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain a photosensitive material showing a remarkable hue change at the exposed part, forming a visible image of high contrast and giving a superior imge by development under a yellow safelight lamp after exposure by adding a condensate of naphthoquinone diazido-sulfone and an azo compound. CONSTITUTION:A coating material is prepared by dissolving a compound represented by formula I or II (where each of Ar and Ar' is an optionally substituted benzene ring) in ethylcellosolve or the like together with alkali-soluble phenol-formaldehyde resin or a condensate of an o-quinone diazide compound. By applying the coating material to an Al plate and drying it a photosensitive layer is formed to obtain a lithographic original plate. When the plate is exposed through an original, the exposed part lone discolors remarkably to obtain a latent image which can be seen under a safelight lamp, and the exposed part is thoroughly removed by dissolution in an alkaline developer. Thus, a fine image is obtd.
JP8477980A 1980-06-23 1980-06-23 Photosensitive material for lithographic original plate Pending JPS5711337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8477980A JPS5711337A (en) 1980-06-23 1980-06-23 Photosensitive material for lithographic original plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8477980A JPS5711337A (en) 1980-06-23 1980-06-23 Photosensitive material for lithographic original plate

Publications (1)

Publication Number Publication Date
JPS5711337A true JPS5711337A (en) 1982-01-21

Family

ID=13840167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8477980A Pending JPS5711337A (en) 1980-06-23 1980-06-23 Photosensitive material for lithographic original plate

Country Status (1)

Country Link
JP (1) JPS5711337A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422955A (en) * 1990-05-18 1992-01-27 Fuji Photo Film Co Ltd Novel quinone diazide compound and photosensitive composition containing this compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422955A (en) * 1990-05-18 1992-01-27 Fuji Photo Film Co Ltd Novel quinone diazide compound and photosensitive composition containing this compound

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