JPS574041A - Photosensitive material for lithographic original plate - Google Patents
Photosensitive material for lithographic original plateInfo
- Publication number
- JPS574041A JPS574041A JP7667680A JP7667680A JPS574041A JP S574041 A JPS574041 A JP S574041A JP 7667680 A JP7667680 A JP 7667680A JP 7667680 A JP7667680 A JP 7667680A JP S574041 A JPS574041 A JP S574041A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive material
- alkali
- diazido
- original plate
- sulfonic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To form a visible latent image of high contrast and to obtain superior alkali developability by using a photosensitive material contg. specified naphtho- quinone-1,2-diazido-5-sulfonic acid ester so as to show a clear hue change in imagewise exposure. CONSTITUTION:4-Hydroxyphenyl or other ester of o-naphthoquinone-1,2-diazido-5- sulfonic acid represented by the formula (where R is H, halogen, NO2, alkyl or alkoxy, n is 1-3 and when n is >=2, R and R are the same or different) is dissolved in an alcohol or cellosolve solvent together with an alkali-soluble resin such as phenol-formaldehyde resin, and the soln. is applied to a support such as an Al plate and dried to form a photosensitive layer. Thus, a photosensitive material for a lithographic original plate is manufactured. When this material is exposed, said compound shows a clear hue change. The exposed part is easily removed by dissolution in an alkali developer, and high-contrast unexposure color of the compound remains at the unexposed part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7667680A JPS574041A (en) | 1980-06-09 | 1980-06-09 | Photosensitive material for lithographic original plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7667680A JPS574041A (en) | 1980-06-09 | 1980-06-09 | Photosensitive material for lithographic original plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS574041A true JPS574041A (en) | 1982-01-09 |
Family
ID=13612023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7667680A Pending JPS574041A (en) | 1980-06-09 | 1980-06-09 | Photosensitive material for lithographic original plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS574041A (en) |
-
1980
- 1980-06-09 JP JP7667680A patent/JPS574041A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3603372C2 (en) | Light-sensitive mixture with a positive effect | |
| US3929488A (en) | Light sensitive diazo composition with azo dye formed from a diazonium salt and a novolak resin | |
| CA1094379A (en) | Photosensitive composition | |
| US5110709A (en) | Light-sensitive positive working composition containing a pisolfone compound | |
| US4348471A (en) | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff | |
| US4356255A (en) | Photosensitive members and a process for forming patterns using the same | |
| US4942113A (en) | Contrast enhanced photolithography | |
| US5153096A (en) | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide | |
| US3785825A (en) | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate | |
| JPS6358440A (en) | Photosensitive composition | |
| US4624908A (en) | Deep ultra-violet lithographic resist composition and process of using | |
| GB1494640A (en) | Image-forming on light-sensitive element containing a quinone diazide | |
| JPS6444439A (en) | Positive photoresist composition | |
| US4622283A (en) | Deep ultra-violet lithographic resist composition and process of using | |
| US4457999A (en) | Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light | |
| US4990429A (en) | Process for the production of negative relief copies utilizing reversal processing | |
| JPS6452148A (en) | Color photographic silver halide composition | |
| US5298364A (en) | Radiation-sensitive sulfonic acid esters and their use | |
| JPS6235349A (en) | Positive type photoresist composition | |
| JPS5660442A (en) | Photosensitive lithographic plate and method for making lithographic plate | |
| US4019907A (en) | Photosensitive azido color-forming element | |
| JPS6193445A (en) | Novel photoresist composition | |
| JPS574041A (en) | Photosensitive material for lithographic original plate | |
| US5273856A (en) | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation | |
| KR960016307B1 (en) | Photosensitive composition based on 1,2-naphtoquinone diazides, and registration material prepared therefrom |