JPS5657035A - Positive type photosensitive composition - Google Patents

Positive type photosensitive composition

Info

Publication number
JPS5657035A
JPS5657035A JP13262079A JP13262079A JPS5657035A JP S5657035 A JPS5657035 A JP S5657035A JP 13262079 A JP13262079 A JP 13262079A JP 13262079 A JP13262079 A JP 13262079A JP S5657035 A JPS5657035 A JP S5657035A
Authority
JP
Japan
Prior art keywords
printing
plate
photosensitive composition
sulfophthalein
org
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13262079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6245972B2 (enrdf_load_stackoverflow
Inventor
Takateru Asano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Original Assignee
Fuji Yakuhin Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK filed Critical Fuji Yakuhin Kogyo KK
Priority to JP13262079A priority Critical patent/JPS5657035A/ja
Publication of JPS5657035A publication Critical patent/JPS5657035A/ja
Publication of JPS6245972B2 publication Critical patent/JPS6245972B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP13262079A 1979-10-15 1979-10-15 Positive type photosensitive composition Granted JPS5657035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13262079A JPS5657035A (en) 1979-10-15 1979-10-15 Positive type photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13262079A JPS5657035A (en) 1979-10-15 1979-10-15 Positive type photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5657035A true JPS5657035A (en) 1981-05-19
JPS6245972B2 JPS6245972B2 (enrdf_load_stackoverflow) 1987-09-30

Family

ID=15085577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13262079A Granted JPS5657035A (en) 1979-10-15 1979-10-15 Positive type photosensitive composition

Country Status (1)

Country Link
JP (1) JPS5657035A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2508188A1 (fr) * 1981-06-19 1982-12-24 Sericol Group Ltd Compositions photosensibles et leur utilisation
US4808513A (en) * 1987-04-06 1989-02-28 Morton Thiokol, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
US5248582A (en) * 1988-09-07 1993-09-28 Fuji Photo Film Co., Ltd. Positive-type photoresist composition

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62202167U (enrdf_load_stackoverflow) * 1986-06-12 1987-12-23

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2508188A1 (fr) * 1981-06-19 1982-12-24 Sericol Group Ltd Compositions photosensibles et leur utilisation
US4808513A (en) * 1987-04-06 1989-02-28 Morton Thiokol, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
US5248582A (en) * 1988-09-07 1993-09-28 Fuji Photo Film Co., Ltd. Positive-type photoresist composition

Also Published As

Publication number Publication date
JPS6245972B2 (enrdf_load_stackoverflow) 1987-09-30

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