JPS5638888A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS5638888A
JPS5638888A JP11416179A JP11416179A JPS5638888A JP S5638888 A JPS5638888 A JP S5638888A JP 11416179 A JP11416179 A JP 11416179A JP 11416179 A JP11416179 A JP 11416179A JP S5638888 A JPS5638888 A JP S5638888A
Authority
JP
Japan
Prior art keywords
forming method
pattern forming
pattern
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11416179A
Other languages
English (en)
Other versions
JPS6321887B2 (ja
Inventor
Takeshi Miyauchi
Katsurou Mizukoshi
Mikio Hongou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11416179A priority Critical patent/JPS5638888A/ja
Publication of JPS5638888A publication Critical patent/JPS5638888A/ja
Publication of JPS6321887B2 publication Critical patent/JPS6321887B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP11416179A 1979-09-07 1979-09-07 Pattern forming method Granted JPS5638888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11416179A JPS5638888A (en) 1979-09-07 1979-09-07 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11416179A JPS5638888A (en) 1979-09-07 1979-09-07 Pattern forming method

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP1086802A Division JPH0259A (ja) 1989-04-07 1989-04-07 パターン投影装置
JP1086803A Division JPH02307A (ja) 1989-04-07 1989-04-07 パターン形成装置及びその方法

Publications (2)

Publication Number Publication Date
JPS5638888A true JPS5638888A (en) 1981-04-14
JPS6321887B2 JPS6321887B2 (ja) 1988-05-10

Family

ID=14630681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11416179A Granted JPS5638888A (en) 1979-09-07 1979-09-07 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5638888A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59220923A (ja) * 1983-05-31 1984-12-12 Toshiba Corp 半導体集積回路のパタ−ン形成方法
JPS605685U (ja) * 1983-06-22 1985-01-16 東芝テック株式会社 振動式電気かみそり
JPS63129619A (ja) * 1986-11-20 1988-06-02 Toshiba Corp パタ−ン露光方法およびパタ−ン露光転写用マスク
JPS6411088A (en) * 1987-03-02 1989-01-13 Hitachi Ltd Laser beam marker and marking method
JPH01157791A (ja) * 1987-12-15 1989-06-21 Komatsu Ltd レーザ転写処理装置
JPH01206101A (ja) * 1987-12-21 1989-08-18 Asea Brown Boveri Ag ら線原理による押しのけ機械
JPH02165880A (ja) * 1988-12-16 1990-06-26 Hitachi Ltd レーザーマーカ
JPH02237011A (ja) * 1989-03-09 1990-09-19 Mitsubishi Electric Corp 縮小投影型露光装置用レチクル，縮小投影型露光装置，大規模集積回路製造法及び大規模集積回路
JPH03180285A (ja) * 1989-08-31 1991-08-06 Komatsu Ltd レーザ印字装置
JPH04288988A (ja) * 1991-03-18 1992-10-14 Hitachi Ltd レーザ加工方法とその装置並びに透過型液晶素子、配線パターン欠陥修正方法とその装置
JPH0898602A (ja) * 1995-05-29 1996-04-16 Iseki & Co Ltd ロ−タリ耕耘装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5035275A (ja) * 1973-02-14 1975-04-03
JPS515953A (ja) * 1974-07-03 1976-01-19 Nippon Electron Optics Lab Shiryohyomennikansuru 2 jidenshisosazono kansatsuhohooyobisochi
JPS5187970A (ja) * 1975-01-31 1976-07-31 Hitachi Ltd
JPS5187912A (ja) * 1975-01-30 1976-07-31 Sony Corp
JPS53136968A (en) * 1977-05-04 1978-11-29 Matsushita Electric Ind Co Ltd Photomask

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5035275A (ja) * 1973-02-14 1975-04-03
JPS515953A (ja) * 1974-07-03 1976-01-19 Nippon Electron Optics Lab Shiryohyomennikansuru 2 jidenshisosazono kansatsuhohooyobisochi
JPS5187912A (ja) * 1975-01-30 1976-07-31 Sony Corp
JPS5187970A (ja) * 1975-01-31 1976-07-31 Hitachi Ltd
JPS53136968A (en) * 1977-05-04 1978-11-29 Matsushita Electric Ind Co Ltd Photomask

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59220923A (ja) * 1983-05-31 1984-12-12 Toshiba Corp 半導体集積回路のパタ−ン形成方法
JPS605685U (ja) * 1983-06-22 1985-01-16 東芝テック株式会社 振動式電気かみそり
JPS63129619A (ja) * 1986-11-20 1988-06-02 Toshiba Corp パタ−ン露光方法およびパタ−ン露光転写用マスク
JPS6411088A (en) * 1987-03-02 1989-01-13 Hitachi Ltd Laser beam marker and marking method
JPH01157791A (ja) * 1987-12-15 1989-06-21 Komatsu Ltd レーザ転写処理装置
JPH01206101A (ja) * 1987-12-21 1989-08-18 Asea Brown Boveri Ag ら線原理による押しのけ機械
JPH02165880A (ja) * 1988-12-16 1990-06-26 Hitachi Ltd レーザーマーカ
JPH02237011A (ja) * 1989-03-09 1990-09-19 Mitsubishi Electric Corp 縮小投影型露光装置用レチクル，縮小投影型露光装置，大規模集積回路製造法及び大規模集積回路
JPH03180285A (ja) * 1989-08-31 1991-08-06 Komatsu Ltd レーザ印字装置
JPH04288988A (ja) * 1991-03-18 1992-10-14 Hitachi Ltd レーザ加工方法とその装置並びに透過型液晶素子、配線パターン欠陥修正方法とその装置
JPH0898602A (ja) * 1995-05-29 1996-04-16 Iseki & Co Ltd ロ−タリ耕耘装置

Also Published As

Publication number Publication date
JPS6321887B2 (ja) 1988-05-10

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